High Contrast Observation of Magnetic Domain with High Voltage SEM
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1976-06-05
著者
-
Ikuta Takashi
Department Of Applied Physics Osaka University
-
Ikuta Takashi
Department Of Applied Physics Faculty Engineering Osaka University
-
SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
-
KINOSHITA Masaharu
Manufacturing Engineering Laboratory, Tokyo Shibaura Electric Co., Ltd.
-
MURAYAMA Tomokazu
Manufacturing Engineering Laboratory, Tokyo Shibaura Electric Co., Ltd.
-
NISHIZAWA Hisao
Japan Electron Optics Laboratory Co., Ltd.
-
YAMAMOTO Toshiyuki
Japan Electron Optics Laboratory Co., Ltd.
-
Kinoshita Masaharu
Manufacturing Engineering Laboratory Tokyo Shibaura Electric Co. Ltd.
-
Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
-
Nishizawa Hisao
Japan Electron Optics Laboratory Co. Ltd.
-
Murayama Tomokazu
Manufacturing Engineering Laboratory Tokyo Shibaura Electric Co. Ltd.
-
Yamamoto Toshiyuki
Japan Electron Optics Laboratory Co. Ltd.
-
Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
関連論文
- High Contrast Observation of Magnetic Domain with High Voltage SEM
- Calculation of X-Ray Production in Alloy Targets by New Approach Using Monte Carlo Method
- Anisotropic Emission of Secondary Electrons from Fe(110) Single Crystal
- Monte Carlo Simulation for Auger Depth Profiling of GaAs/AlAs Superlattice Structure by Ar^+ Ion Sputtering
- Auger Depth Profiles of a GaAs/AlAs Superlattice Structure Obtained with O^+_2 and Ar^+ Ion Sputtering
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
- Titanium Nitride Crystal Growth with Preferred Orientation by Dynamic Mixing Method
- Electron Impact Spectra of Mercury in Intermediate Energies
- Spin-Polarization and Differential Cross Section of Electron-Mercury Inelastic Scattering
- Two-Dimensional Stationary Soliton in a Steady Hydromagnetic Flow
- Axisymmetric Hydromagnetic Flow Caused by Rotating Conductor
- Fourier analysis of HRTEM image deterioration caused by mechanical vibration
- Nano-area electron diffraction pattern reconstructed from three-dimensional Fourier spectrum
- Real-time observation of spherical aberration-free phase image using high-speed image processing CCD video camera
- Monte Carlo Simulation of Generations of Continuous and Characteristic X-Rays by Electron Impact
- Optimization of voltage axis alignment in high-resolution electron microscopy
- Development of a real-time defocus-image modulation processing electron microscope. II. Dynamic observation of spherical aberration-free phase image of surface atoms
- Development of a real-time defocus image modulation processing electron microscope. I. Construction
- TEM Study of the Interface Structure of CVD Diamond Heteroepitaxilly Grown on Pt(111) Substrate
- Preliminary experiments for development of real-time defocus-image modulation processing electron microscope
- Cross-Sectional Transmission Electron Microscope Observation of Isolated Diamond Particles Heteroepitaxially Grown on Pt(111) Substrate
- Observation of Al surface during sputter-cleaning and annealing procedures under UHV-REM
- Nonlinear Modulation of Spatial Waves in a Steady Plasma Flow
- Shocks and Solitions in a Steady Plasma Flow
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography : Micro/nanofabrication and Devices
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography
- Extraction of Spherical and Chromatic Aberration -free Information by Focal-depth Extension Processing Under Tilted Illumination
- Interaction Potential between He^+ and Ti in a keV Range as Revealed by a Specialized Technique in Ion Scattering Spectroscopy
- Surface Structure of Zr-O/W(100) System at 1700 K
- Anomaly in Sputtering on Titanium Nitride Film Growth by Post-Irradiation Processing
- Work Function Change Measured by Electron Beam Chopping Technique as Applied to Oxygen-Adsorbed W(100) at High Temperature
- Ion-Assisted Crystal Growth by Post Irradiation as Applied to Nitride Formatiorn
- Study on Zr-Si/W(100) Surface at High Temperatures by Reflection High Energy Electron Diffraction
- Study on Zr-Si/W(100) Surface at High Temperatures by Combined Surface Analysis Techniques
- Monte Carlo Simulation Approach to Sputtering in Multi-Component Targets
- Approximation Formula of Cross-section for the Universal Potential Expression Proposed by Ziegler et al.
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization. : III. Change of the Velocity Distribution with Time after Sputtering
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization. : II. A Quantitative Composition Analysis of Cu-Al Alloy
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization : I. Development of Laser Ion Counting System with a Simple Time-of-Flight Measurement
- Reflection of keV Light Particles from Random Solidsby Modified Single-Collision Model
- A New Bessel-Box Energy Analyzer for Sputtered Neutral Mass Spectrometry
- An Application of Square Wave Modulation Technique to Scanning Auger Electron Microscopy
- Formation of "bcc Boundary Phase" in Transmission Electron Microscopy Samples of Nd-Fe-B Sintered Magnets
- Coercivity and Grain Boundary Morphology in Nd-Fe-B Sintered Magnets
- Auger Study of Preferential Sputtering for Cu-Ni Alloy Sample
- Distortion of Elastically Scattered Electron Energy Spectrum in a Retarding Field Type Spectrometer
- Influence of anti-symmetric wave aberrations and the simple correction filter in the Fourier space
- LEED-Work Function Studies on Fe(100)
- Photoelectric Work Function Study on Iron (100) Surface Combined with Auger Electron Spectroscopy
- An aberration-free imaging technique based on focal depth extension
- Continuum X-Ray Generation from W Film on Cu Substrate
- Sputtering of Si with keV Ar^+ Ions : II.Computer Simulation of Sputter Broadening Due to Ion Bombardment in Depth Profiling
- Sputtering of Si with keV Ar^+ Ions. : I. Measurement and Monte Carlo Calculations of Sputtering Yield
- Calculation of Electron Spin Polarization for Polarization Detector
- New Computer Simulation Software of Electron Trajectories for Evaluation of Magnetic Field Immersion-Type Field Emission Gun
- Accumulation Effect of Bombarding N^+_2 Ions in Al for Crystal Growth of AlN Film
- Study of Accumulation Effect of Bombarding N^+_2 Ions on Al Surface by Auger Electron Spectroscopy
- New Neutral- and Ion-Scattering Spectroscopy as Applied to Selective Adsorption of Hydrogen on Cu-Pt Alloy Surfaces
- Comparison of Energy-Loss Functions from Reflection Electron Energy-Loss Spectroscopy Spectra with Surface and Bulk Energy-Loss Functions : in Case of Cu
- Study on the Resolution of the Backscattered Electron Image by the Monte Carlo Method
- Monte Carlo Calculations on Electron Scattering in a Solid Target
- A New Type Edge Effect in High Resolution Scanning Electron Microscopy
- Stability of Beam Current of Single Crystal LaB_6 Cathode in High Vacuum
- Field Emission Pattern of LaB_6-Single Crystal Tip
- Cross-Sectional Transmission Electron Microscopic Observation of Etch Hillocks and Etch Pits in LiTaO_3 Single Crystal
- Basic Study of Quantitative Ion Scattering Spectroscopy I Correction Factors for Quantification
- Surface and Interface Study of Titanium Nitride on Si Substrate Produced by Dynamic Ion Beam Mixing Method
- Reflectioru High Energy Electron Diffraction Observation of Dynamic Ion Beam Mixing Process in Titanium Nitride Crystal Growth
- Light and Secondary Ion Emissions from Ion Bombarded Solid Surfaces
- The Effect of Ejection Angle in Ion-Beam Sputter Deposition of Superconducting Amorphous Beryllium Film
- Construction of Retarding Field Cylindrical Mirror Analyzer
- Anomaly in Sputtering of Aluminum under N^+_2 Ion Bombardment
- Weibull Distribution of X-Ray Pulse-Height
- A Study on Electron Diffusion in X-ray Microanalyzer Specimen
- An Approach for Nanolithography Using Electron Holography
- Nanoprobe cathodoluminescence scanning electron microscope as aplied to synthesized diamond
- Observation of Reconstructed Pt(100) Surface by Reflection Electron Microscopy
- Computer Simulation Analysis of the Planar Channeling Effect in Practical Ion Implantation : Semiconductors and Semiconductor Devices
- Cross-sectional High-Resolution Transmission Electron Microscope Study of Heteroepitaxial Diamond Film Grown on Pt Substrate
- Ion Beam Assisted Deposition of Metal Organic Films Using Focused Ion Beams
- Application of the Focused-Ion-Beam Technique for Preparing the Cross-Sectional Sample of Chemical Vapor Deposition Diamond Thin Film for High-Resolution Transmission Electron Microscope Observation
- Development of coincidence transmission electron microscope (II) Observation of coincidence electron microscopic image
- Development of Coincidence Transmission Electron Microscope (I) Coincidence Image Construction System
- Initial Stage of Preferential Sputtering in Cu-Pt Alloy Studied by Sputtered Neutrals Mass Spectrometry
- Energy Distributions of Atoms Sputtered from Cu-Pt Alloy Measured by Nonresonarut Multiphoton Ionization Sputtered Neutrals Mass Spectrometry
- Monte Carlo Simulation of Secondary Electron Emission from Tungsten Surfaces with Various Work Functions as Applied to Sc/W Surfaces
- Measurement of the Energy Distributions of Secondary Ions from Pure Metals and Alloys
- A Hybrid Monte Carlo Calculation Estimate of Angular Distribution of Sputtered Atoms for keV Proton Bombardment
- An Ion Beam Apparatus in the Range of keV-Energies
- Ion Induced Auger Electron Emission from Al-Mg Alloy under Low Energy Argon Ion Bombardment
- Monte Carlo Simulation of Multiple Inelastic Scatterings in Crystals
- New Computer Simulation Software of Electron Trajectories for Evaluation of Magnetic Field Immersion-Type Field Emission Gun
- Image Intensifier with Fiber Optics Plate and Image Orthicon Tube for Electron Microscope
- Monte Carlo Simulations of the Behavior of Energetic Light Ions in Solids
- Depth Distribution of Characteristic X-rays in EPMA Alloy Targets : I. Angular Distribution and f(x)-Curves of Fe K X-rays in Fe-Al Alloy Targets
- Secondary Electron Emission from Aluminum by Argon and Oxygen Ion Bombardment below 3 keV
- Fundamental Studies on Quantitative Analysis in Ion Probe Microanalyzer
- Secondary Electron Measurement with Auger Electron Microprobe. : I. Calibration of the CMA in the Low-Energy Region
- Angular Distributions of Sputtered Particles Ejected from Pure Cu, Pt and Cu -Pt Alloy under 3 keV Ar^+ Ton Bombardment
- Surface Analyzer Combining Secondary Ion Mass Spectrometry and Ion Scattering Spectrometry(速報)