Fundamental Studies on Quantitative Analysis in Ion Probe Microanalyzer
スポンサーリンク
概要
- 論文の詳細を見る
The fundamental studies on the quantitative correction procedures of the ion probe micro-analysis based on the Saha-Eggert equation have been made to examine then validity and to develop an appropriate minimum seeking method. The correction procedures were checked by applying them to the analysis of a standard sample of known concentration. The agreement between the calculated and themical concentrations is generally good. The accuracy of the quantitative analysis is discussed in terms of the degree of ionization as a function of both the temperature and electron density which are calculated from the Saha-Eggert equation.
- 社団法人応用物理学会の論文
- 1974-02-05
著者
-
Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
-
Ishitani Tohru
Department Of Applied Physics Faculty Of Engineering Osaka University
-
Ueshima Yasumasa
Department Of Applied Physics Osaka University
-
Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
関連論文
- High Contrast Observation of Magnetic Domain with High Voltage SEM
- Calculation of X-Ray Production in Alloy Targets by New Approach Using Monte Carlo Method
- Anisotropic Emission of Secondary Electrons from Fe(110) Single Crystal
- Monte Carlo Simulation for Auger Depth Profiling of GaAs/AlAs Superlattice Structure by Ar^+ Ion Sputtering
- Auger Depth Profiles of a GaAs/AlAs Superlattice Structure Obtained with O^+_2 and Ar^+ Ion Sputtering
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
- Titanium Nitride Crystal Growth with Preferred Orientation by Dynamic Mixing Method
- Electron Impact Spectra of Mercury in Intermediate Energies
- Spin-Polarization and Differential Cross Section of Electron-Mercury Inelastic Scattering
- Fourier analysis of HRTEM image deterioration caused by mechanical vibration
- Nano-area electron diffraction pattern reconstructed from three-dimensional Fourier spectrum
- Real-time observation of spherical aberration-free phase image using high-speed image processing CCD video camera
- Monte Carlo Simulation of Generations of Continuous and Characteristic X-Rays by Electron Impact
- Optimization of voltage axis alignment in high-resolution electron microscopy
- Development of a real-time defocus-image modulation processing electron microscope. II. Dynamic observation of spherical aberration-free phase image of surface atoms
- Development of a real-time defocus image modulation processing electron microscope. I. Construction
- TEM Study of the Interface Structure of CVD Diamond Heteroepitaxilly Grown on Pt(111) Substrate
- Preliminary experiments for development of real-time defocus-image modulation processing electron microscope
- Cross-Sectional Transmission Electron Microscope Observation of Isolated Diamond Particles Heteroepitaxially Grown on Pt(111) Substrate
- Observation of Al surface during sputter-cleaning and annealing procedures under UHV-REM
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography : Micro/nanofabrication and Devices
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography
- Extraction of Spherical and Chromatic Aberration -free Information by Focal-depth Extension Processing Under Tilted Illumination
- Interaction Potential between He^+ and Ti in a keV Range as Revealed by a Specialized Technique in Ion Scattering Spectroscopy
- Surface Structure of Zr-O/W(100) System at 1700 K
- Anomaly in Sputtering on Titanium Nitride Film Growth by Post-Irradiation Processing
- Work Function Change Measured by Electron Beam Chopping Technique as Applied to Oxygen-Adsorbed W(100) at High Temperature
- Ion-Assisted Crystal Growth by Post Irradiation as Applied to Nitride Formatiorn
- Study on Zr-Si/W(100) Surface at High Temperatures by Reflection High Energy Electron Diffraction
- Study on Zr-Si/W(100) Surface at High Temperatures by Combined Surface Analysis Techniques
- Monte Carlo Simulation Approach to Sputtering in Multi-Component Targets
- Approximation Formula of Cross-section for the Universal Potential Expression Proposed by Ziegler et al.
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization. : III. Change of the Velocity Distribution with Time after Sputtering
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization. : II. A Quantitative Composition Analysis of Cu-Al Alloy
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization : I. Development of Laser Ion Counting System with a Simple Time-of-Flight Measurement
- Reflection of keV Light Particles from Random Solidsby Modified Single-Collision Model
- A New Bessel-Box Energy Analyzer for Sputtered Neutral Mass Spectrometry
- An Application of Square Wave Modulation Technique to Scanning Auger Electron Microscopy
- Formation of "bcc Boundary Phase" in Transmission Electron Microscopy Samples of Nd-Fe-B Sintered Magnets
- Coercivity and Grain Boundary Morphology in Nd-Fe-B Sintered Magnets
- Auger Study of Preferential Sputtering for Cu-Ni Alloy Sample
- Distortion of Elastically Scattered Electron Energy Spectrum in a Retarding Field Type Spectrometer
- LEED-Work Function Studies on Fe(100)
- Photoelectric Work Function Study on Iron (100) Surface Combined with Auger Electron Spectroscopy
- Continuum X-Ray Generation from W Film on Cu Substrate
- Sputtering of Si with keV Ar^+ Ions : II.Computer Simulation of Sputter Broadening Due to Ion Bombardment in Depth Profiling
- Sputtering of Si with keV Ar^+ Ions. : I. Measurement and Monte Carlo Calculations of Sputtering Yield
- Calculation of Electron Spin Polarization for Polarization Detector
- Accumulation Effect of Bombarding N^+_2 Ions in Al for Crystal Growth of AlN Film
- Study of Accumulation Effect of Bombarding N^+_2 Ions on Al Surface by Auger Electron Spectroscopy
- New Neutral- and Ion-Scattering Spectroscopy as Applied to Selective Adsorption of Hydrogen on Cu-Pt Alloy Surfaces
- Study on the Resolution of the Backscattered Electron Image by the Monte Carlo Method
- Monte Carlo Calculations on Electron Scattering in a Solid Target
- A New Type Edge Effect in High Resolution Scanning Electron Microscopy
- Stability of Beam Current of Single Crystal LaB_6 Cathode in High Vacuum
- Field Emission Pattern of LaB_6-Single Crystal Tip
- Cross-Sectional Transmission Electron Microscopic Observation of Etch Hillocks and Etch Pits in LiTaO_3 Single Crystal
- Basic Study of Quantitative Ion Scattering Spectroscopy I Correction Factors for Quantification
- Surface and Interface Study of Titanium Nitride on Si Substrate Produced by Dynamic Ion Beam Mixing Method
- Reflectioru High Energy Electron Diffraction Observation of Dynamic Ion Beam Mixing Process in Titanium Nitride Crystal Growth
- Light and Secondary Ion Emissions from Ion Bombarded Solid Surfaces
- The Effect of Ejection Angle in Ion-Beam Sputter Deposition of Superconducting Amorphous Beryllium Film
- Construction of Retarding Field Cylindrical Mirror Analyzer
- Anomaly in Sputtering of Aluminum under N^+_2 Ion Bombardment
- Weibull Distribution of X-Ray Pulse-Height
- A Study on Electron Diffusion in X-ray Microanalyzer Specimen
- An Approach for Nanolithography Using Electron Holography
- Nanoprobe cathodoluminescence scanning electron microscope as aplied to synthesized diamond
- Characterization of Sc-O/W(100) Surface as Schottky Emitter : Work Function Change for Activation Processing
- Observation of Reconstructed Pt(100) Surface by Reflection Electron Microscopy
- Computer Simulation Analysis of the Planar Channeling Effect in Practical Ion Implantation : Semiconductors and Semiconductor Devices
- Cross-sectional High-Resolution Transmission Electron Microscope Study of Heteroepitaxial Diamond Film Grown on Pt Substrate
- Ion Beam Assisted Deposition of Metal Organic Films Using Focused Ion Beams
- Application of the Focused-Ion-Beam Technique for Preparing the Cross-Sectional Sample of Chemical Vapor Deposition Diamond Thin Film for High-Resolution Transmission Electron Microscope Observation
- Development of coincidence transmission electron microscope (II) Observation of coincidence electron microscopic image
- Development of Coincidence Transmission Electron Microscope (I) Coincidence Image Construction System
- Initial Stage of Preferential Sputtering in Cu-Pt Alloy Studied by Sputtered Neutrals Mass Spectrometry
- Energy Distributions of Atoms Sputtered from Cu-Pt Alloy Measured by Nonresonarut Multiphoton Ionization Sputtered Neutrals Mass Spectrometry
- Monte Carlo Simulation of Secondary Electron Emission from Tungsten Surfaces with Various Work Functions as Applied to Sc/W Surfaces
- Measurement of the Energy Distributions of Secondary Ions from Pure Metals and Alloys
- A Hybrid Monte Carlo Calculation Estimate of Angular Distribution of Sputtered Atoms for keV Proton Bombardment
- An Ion Beam Apparatus in the Range of keV-Energies
- Ion Induced Auger Electron Emission from Al-Mg Alloy under Low Energy Argon Ion Bombardment
- Monte Carlo Simulation of Multiple Inelastic Scatterings in Crystals
- New Computer Simulation Software of Electron Trajectories for Evaluation of Magnetic Field Immersion-Type Field Emission Gun
- Monte Carlo Simulations of the Behavior of Energetic Light Ions in Solids
- Depth Distribution of Characteristic X-rays in EPMA Alloy Targets : I. Angular Distribution and f(x)-Curves of Fe K X-rays in Fe-Al Alloy Targets
- Secondary Electron Emission from Aluminum by Argon and Oxygen Ion Bombardment below 3 keV
- Fundamental Studies on Quantitative Analysis in Ion Probe Microanalyzer
- Experimental Studies of Secondary Electron Emission of TiO2 and Ti
- Comparison of Energy-Loss Functions from Reflection Electron Energy-Loss Spectroscopy Spectra with Surface and Bulk Energy-Loss Functions: in Case of Cu
- Secondary Electron Measurement with Auger Electron Microprobe. : I. Calibration of the CMA in the Low-Energy Region
- Angular Distributions of Sputtered Particles Ejected from Pure Cu, Pt and Cu -Pt Alloy under 3 keV Ar^+ Ton Bombardment
- Surface Analyzer Combining Secondary Ion Mass Spectrometry and Ion Scattering Spectrometry(速報)
- The f(χ)-Curves for FeKα and AlKα X-Rays in the Inclined EPMA Targets of Fe, Al and Fe-Al Alloy
- Monte Carlo Simulation of Generations of Continuous and Characteristic X-Rays by Electron Impact
- Characterization of a refractory surface at a high temperature applied to the Zr-O/W(100) system. On self-recovery function
- A Simple Calculation on Backscattering of Light Ions of KeV Energies
- Investigation of Energy Dissipation of Electrons in Al- and Cu-Targets by Monte Carlo Method
- Monte Carlo Simulations on Scattering of Bombarded Ions in Solids