Development of coincidence transmission electron microscope (II) Observation of coincidence electron microscopic image
スポンサーリンク
概要
- 論文の詳細を見る
- Published for the Japanese Society of Electron Microscopy by Oxford University Pressの論文
- 1997-02-01
著者
-
木村 吉秀
阪大院・工
-
木村 吉秀
大阪大 大学院工学研究科
-
Shimizu R
Osaka Univ. Osaka Jpn
-
Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
-
Kimura Yoshihide
Department Of Applied Physics Faculty Of Engineering Osaka University
-
YASUNO Motohide
Department of Applied Physics, Faculty of Engineering, Osaka University
-
Yasuno Motohide
Department Of Applied Physics Faculty Of Engineering Osaka University
-
Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
関連論文
- 超解像位相差電子顕微鏡とは
- 集束イオンビームを用いた電子光学系輪帯瞳用アパーチャの作製
- High Contrast Observation of Magnetic Domain with High Voltage SEM
- Calculation of X-Ray Production in Alloy Targets by New Approach Using Monte Carlo Method
- 次世代超電子顕微鏡の開発
- 実時間焦点位置変調法による位相再構成と分解能向上
- 3次元フーリエフィルタリング法による位相再構成
- 28aWP-11 球面収差除去した高分解能光電子顕微鏡の開発(表面界面構造(半導体))(領域9)
- 実時間演算機能を有するCCDカメラの開発
- Anisotropic Emission of Secondary Electrons from Fe(110) Single Crystal
- 電界放出型電子銃を用いたカソードルミネッセンス走査型電子顕微鏡の開発
- Monte Carlo Simulation for Auger Depth Profiling of GaAs/AlAs Superlattice Structure by Ar^+ Ion Sputtering
- Auger Depth Profiles of a GaAs/AlAs Superlattice Structure Obtained with O^+_2 and Ar^+ Ion Sputtering
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
- Titanium Nitride Crystal Growth with Preferred Orientation by Dynamic Mixing Method
- Electron Impact Spectra of Mercury in Intermediate Energies
- Spin-Polarization and Differential Cross Section of Electron-Mercury Inelastic Scattering
- Separation of linear and non-linear imaging components in high-resolution transmission electron microscope images
- Development of Monte Carlo Simulation of Generation of Continuous and Characteristic X-Rays by Electron Impact (Short Note)
- Fourier analysis of HRTEM image deterioration caused by mechanical vibration
- Nano-area electron diffraction pattern reconstructed from three-dimensional Fourier spectrum
- Real-time observation of spherical aberration-free phase image using high-speed image processing CCD video camera
- Flattening of Surface by Sputter-Etching with Low-Energy Ions : Instrumentation, Measurement, and Fabrication Technology
- Monte Carlo Simulation Study of Backscattered Electron Imaging in a Chemical Vapor Deposition Scanning Electron Microscope
- Floating-type Compact Low-energy Ion Gun - Basic Performance for High-resolution Depth Profiling -
- Monte Carlo Simulation of Generations of Continuous and Characteristic X-Rays by Electron Impact
- Optimization of voltage axis alignment in high-resolution electron microscopy
- Development of a real-time defocus-image modulation processing electron microscope. II. Dynamic observation of spherical aberration-free phase image of surface atoms
- Development of a real-time defocus image modulation processing electron microscope. I. Construction
- TEM Study of the Interface Structure of CVD Diamond Heteroepitaxilly Grown on Pt(111) Substrate
- Evaluation of image drift correction by three-dimensional Fourier analysis
- Preliminary experiments for development of real-time defocus-image modulation processing electron microscope
- Cross-Sectional Transmission Electron Microscope Observation of Isolated Diamond Particles Heteroepitaxially Grown on Pt(111) Substrate
- Observation of Al surface during sputter-cleaning and annealing procedures under UHV-REM
- 未来開拓学術研究推進事業プロジェクト「次世代超電子顕微鏡の開発」 -実時間球面収差補正位相像観察-
- 未来開拓学術研究推進事業プロジェクト「次世代超電子顕微鏡の開発」 -能動型焦点位置変調電子顕微鏡の開発-
- 実時間球面収差補正 (新手法--21世紀に向けて)
- 焦点位置変調電子顕微鏡法による収差補正技術の開発とその応用
- 19pXC-3 焦点位置変調法を用いた波動場再構成技術の現状と今後の可能性(シンポジウム 最新電子顕微鏡法を使った物性研究のいぶき,領域10,誘導体,格子欠陥,X線・粒子線,フォノン物性)
- 高分解能電子顕微鏡用演算機能内蔵型CCDカメラ (特集 新産業創出と独創的研究)
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography : Micro/nanofabrication and Devices
- Microfabricated Submicron Al-Filament Biprism as Applied to Electron Holography
- Extraction of Spherical and Chromatic Aberration -free Information by Focal-depth Extension Processing Under Tilted Illumination
- Surface Phonon of MgO Layer on TiC(100) Surface
- Interaction Potential between He^+ and Ti in a keV Range as Revealed by a Specialized Technique in Ion Scattering Spectroscopy
- Initial Stage of Oxidation of Si(001)-2 × Surface Studied by X-Ray Photoelectron Spectroscopy
- Initial Stage of Oxidation of Si(001)-2x1 Surface Studied by X-Ray Photoelectron Spectroscopy
- Surface Structure of Zr-O/W(100) System at 1700 K
- Anomaly in Sputtering on Titanium Nitride Film Growth by Post-Irradiation Processing
- Work Function Change Measured by Electron Beam Chopping Technique as Applied to Oxygen-Adsorbed W(100) at High Temperature
- Ion-Assisted Crystal Growth by Post Irradiation as Applied to Nitride Formatiorn
- Study on Zr-Si/W(100) Surface at High Temperatures by Reflection High Energy Electron Diffraction
- Study on Zr-Si/W(100) Surface at High Temperatures by Combined Surface Analysis Techniques
- Monte Carlo Simulation Approach to Sputtering in Multi-Component Targets
- Approximation Formula of Cross-section for the Universal Potential Expression Proposed by Ziegler et al.
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization. : III. Change of the Velocity Distribution with Time after Sputtering
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization. : II. A Quantitative Composition Analysis of Cu-Al Alloy
- Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization : I. Development of Laser Ion Counting System with a Simple Time-of-Flight Measurement
- Reflection of keV Light Particles from Random Solidsby Modified Single-Collision Model
- A New Bessel-Box Energy Analyzer for Sputtered Neutral Mass Spectrometry
- An Application of Square Wave Modulation Technique to Scanning Auger Electron Microscopy
- Formation of "bcc Boundary Phase" in Transmission Electron Microscopy Samples of Nd-Fe-B Sintered Magnets
- Coercivity and Grain Boundary Morphology in Nd-Fe-B Sintered Magnets
- Distortion of Elastically Scattered Electron Energy Spectrum in a Retarding Field Type Spectrometer
- A Structural Analysis of the HfB_2 (0001) Surface
- LEED-Work Function Studies on Fe(100)
- Photoelectric Work Function Study on Iron (100) Surface Combined with Auger Electron Spectroscopy
- Continuum X-Ray Generation from W Film on Cu Substrate
- Sputtering of Si with keV Ar^+ Ions : II.Computer Simulation of Sputter Broadening Due to Ion Bombardment in Depth Profiling
- Sputtering of Si with keV Ar^+ Ions. : I. Measurement and Monte Carlo Calculations of Sputtering Yield
- Calculation of Electron Spin Polarization for Polarization Detector
- Accumulation Effect of Bombarding N^+_2 Ions in Al for Crystal Growth of AlN Film
- Study of Accumulation Effect of Bombarding N^+_2 Ions on Al Surface by Auger Electron Spectroscopy
- New Neutral- and Ion-Scattering Spectroscopy as Applied to Selective Adsorption of Hydrogen on Cu-Pt Alloy Surfaces
- Study on the Resolution of the Backscattered Electron Image by the Monte Carlo Method
- Monte Carlo Calculations on Electron Scattering in a Solid Target
- Stability of Beam Current of Single Crystal LaB_6 Cathode in High Vacuum
- Field Emission Pattern of LaB_6-Single Crystal Tip
- Cross-Sectional Transmission Electron Microscopic Observation of Etch Hillocks and Etch Pits in LiTaO_3 Single Crystal
- Basic Study of Quantitative Ion Scattering Spectroscopy I Correction Factors for Quantification
- Surface and Interface Study of Titanium Nitride on Si Substrate Produced by Dynamic Ion Beam Mixing Method
- Reflectioru High Energy Electron Diffraction Observation of Dynamic Ion Beam Mixing Process in Titanium Nitride Crystal Growth
- Light and Secondary Ion Emissions from Ion Bombarded Solid Surfaces
- The Effect of Ejection Angle in Ion-Beam Sputter Deposition of Superconducting Amorphous Beryllium Film
- Construction of Retarding Field Cylindrical Mirror Analyzer
- Anomaly in Sputtering of Aluminum under N^+_2 Ion Bombardment
- An Approach for Nanolithography Using Electron Holography
- Atomic Structure of CaF_2/Si(111) Interface and Defect Formation on CaF_2(111) Surface by Electron Irradiation
- Computer Simulation Analysis of the Planar Channeling Effect in Practical Ion Implantation : Semiconductors and Semiconductor Devices
- Cross-sectional High-Resolution Transmission Electron Microscope Study of Heteroepitaxial Diamond Film Grown on Pt Substrate
- 8 nm Wide Line Fabrication in PMMA on Si Wafers by Electron Beam Exposure
- A Stable High-Brightness Electron Gun with Zr/W-tip for Nanometer Lithography. : I. Emission Properties in Schottky- and Thermal Field-Emission Regions
- Ion Beam Assisted Deposition of Metal Organic Films Using Focused Ion Beams
- Application of the Focused-Ion-Beam Technique for Preparing the Cross-Sectional Sample of Chemical Vapor Deposition Diamond Thin Film for High-Resolution Transmission Electron Microscope Observation
- Development of coincidence transmission electron microscope (II) Observation of coincidence electron microscopic image
- Development of a Nanoprobe Cathodoluminescence Scanning Electron Microscope
- Development of Coincidence Transmission Electron Microscope (I) Coincidence Image Construction System
- A14 新しい照射電子量低減機能を備えたTEMにより明らかにされたhalloysite中の積層構造(口頭発表,一般講演)
- Changes of Volume and Surface Compositions of Polymethylmethacrylate under Electron Beam Irradiation in Lithography
- Polygonal halloysite の構造