Fujino T | Information Technology R&d Center Mitsubishi Electric Corporation:communication Systems R&d

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著作論文

A Multiple Open-Loop Frequency Estimation Based on Differential Detection for MPSK
Electron Beam Direct Writing Technologies for 0.3-μm ULSI Devices : Lithography Technology
Electron Beam Direct Writing Technologies for 0.3-μm ULSI Devices
X-Ray Mask Fabrication Process Using Cr Mask and ITO Stopper in the Dry Etching of W Absorber
A Soft-Output Viterbi Equalizer Employing Expanded Memory Length in a Trellis
Performance of DS/GMSK/PSK Modulation with Four-Phase Correlator and Its Application to Demodulator LSI (Special Section on Spread Spectrum Techniques and Applications)
Electron Beam Direct Writing Techniques for the Development of Sub-Quarter-Micron Devices
Proximity Effect Correction for 1:1 X-Ray Mask Fabrication
Application of Proximity Effect Correction Usirng Pattern-Area Density to Patterning on a Heavy-Metal Substrate and the Cell-Projection Exposure
Sputtered W-Ti Film for X-Ray Mask Absorber
Fabrication of 0.25-μm Pattern on a Membrane Substrate-Based X-Ray Absorber : X-Ray Lithography
Fabrication of 0.25-μm Patterns on a Membrane Substrate-Based X-Ray Absorber

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