Reaction Mechanism of Chemical Vapor Deposition Using Tetraethylorthosilicate and Ozone at Atmospheric Pressure
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-09-15
著者
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KAWAHARA Toshio
Department of Materials Science and Engineering, National Defense Academy
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Matsui Yasushi
Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat
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MATSUI Yasuji
Central Research Laboratory, Mitsubishi Electric Corp.
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YUUKI Akimasa
Central Research Laboratory, Mitsubishi Electric Corp.
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Muto Y
The Institute For Materials Research Tohoku University
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Yuuki A
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Yuuki Akimasa
Product Development Laboratory Mitsubishi Electric Corporation
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Yuuki Akimasa
Central Research Laboratory Mitsubishi Electric Corp.
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Kawahara T
Semiconductor Leading Edge Technol. Inc. Tsukuba-shi Jpn
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KAWAHARA Takaaki
Central Research Laboratory, Mitsubishi Electric Corp.
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Matsui Yasuji
Central Research Laboratory Mitsubishi Electric Corp.
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Kawahara T
Faculty Of Technology Tokyo University Of Agriculture And Technology
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