Low-Temperature Growth of SiO_2 Thin Film by Photo-Induced Chemical Vapor Deposition Using Synchrotron Radiation

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概要

• 論文の詳細を見る
• 1992-06-30

著者

• Hamakawa Yoshihiro

  Faculty Of Science And Engineering Ritsumeikan University

• Hamakawa Yoshihiro

  Department Of Electrical Engineering Faculty Of Engineering Science Osaka University

• OKUYAMA Masanori

  Department of Electrical Engineering, Facully of Engineering Science, Osaka University

• Nakamura M

  Hitachi Ltd. Ibaraki Jpn

• Okuyama Masanori

  Department Of Electrical Engineering Faculty Of Engineering Schience Osaka University

• Okuyama Masanori

  Faculty Of Engineering Science Osaka University

• NAKAMURA Masakazu

  Department of Electronics and Mechanical Engineering, Faculty of Engineering, Chiba University

• Matsui Yasushi

  Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat

• Okuyama M

  Osaka Univ. Osaka Jpn

• MATSUI Yuichi

  Department of Electrical Engineering, Faculty of Engineering Science, Osaka University

• NAGAYOSHI Ryoichi

  Department of Electrical Engineering, Faculty of Engineering Science, Osaka University

• Muto Y

  The Institute For Materials Research Tohoku University

• Hamakawa Y

  Faculty Of Science And Engineering Ritsumeikan University

• Nagayoshi Ryoichi

  Department Of Electrical Engineering Faculty Of Engineering Science Osaka University

• Hamakawa Yoshihiro

  Department Of Electrical Engineering Faculty Of Engineering Osaka University

• Nakamura M

  Toshiba Corp. Yokohama Jpn

• Nakamura Masakazu

  Department Of Electronics And Mechanical Engineering Chiba University

• Nakamura Masakazu

  Department Of Electrical Engineering Faculty Of Engineering Science Osaka University

• Nakamura Masakazu

  Department of Applied Chemistry, Faculty of Engineering, Keio University

関連論文

• Low-Temperature Growth of SiO_2 Thin Film by Photo-Induced Chemical Vapor Deposition Using Synchrotron Radiation
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