Okuyama Masanori | Faculty Of Engineering Science Osaka University

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概要

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著作論文

Low-Temperature Growth of SiO_2 Thin Film by Photo-Induced Chemical Vapor Deposition Using Synchrotron Radiation
Observation of Deep Impurity Levels in In_GA_As_P_
Lineshape Morphology in Modulation Spectroscopy (Selected Topics in Semiconductor Physics) -- (Modulation Spectroscopy)
Strained SrTiO_3/ BaTiO_3 Superlattices Formed by Laser Ablation Technique and Their High Dielectric Properties
Chemical Vapor Deposition of PbTiO_3 Thin Film : T: THIN FILM
Preparation of PbTiO_3 Ferroelectric Thin Film by Chemical Vapor Deposition
Preparation of PbTiO_3 Ferroelectric Thin Film by Laser Annealing : THIN FILM
Preparation of PbTiO_3 Ferroelectric Thin Film by RF Sputtering
Ferroelectric Properties of RF Sputtered PLZT Thin Film
Electric and Pyroelectric Behaviors of PbTiO_3 Thin Films Formed by an Excimer Laser Ablation Technique
Preparation of PbTiO_3 Thin Films by an Excimer Laser Ablation Technique with Second Laser Irradiation
Microstructures and Electrical Properties of (Pb, La)TiO_3 Thin Films Grown on the Pt Electrodes with a Percolating Network Structure
Investigation of Grain-Size Influence on the Ferroelectric-to-Paraelectric Phase Transition in BaTiO_3 Ceramics by Means of AC Calorimetry
Simulation of Switching Properties of Ferroelectrics on the Basis of Dipole Lattice Model
Grain Size Dependence of Switching Properties of Ferroelectric BaTiO_3 Ceramics
Oxygen and Fluorine Treatment Effect on Silicon Surface Characterized by Infrared Reflection Absorption Spectroscopy
Electron Emission frorm Lead-Zirconate-Titanate Ferroelectric Ceramic Induced by Pulse Electric Field ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
Electron Emission from PZT Ceramic by External Pulsed Electric Fields : Pulse Voltage Dependence of Emitted Charge
Preparation of PbTiO_3 Thin Film on Si by ArF Excimer Baser Ablation
Electron Emission into Vacuum from Lead-Zirconate-Titanate Ferroelectric Ceramics Induced by Polarization Reversal
In-Situ Characterization of Si Surface Oxidation by High-Sensitivity Infrared Reflection Spectroscopic Method
Field-Excited Electron Emission from Ferroelectric Ceramic in Vacuum
High-Sensitivity Infrared Characterization of Ultrathin SiO_2 Film by Grazing Internal Reflection Method
PbTiO_3 Thin Films Deposited by Laser Ablation : Thin Films
Characterization of F_2 Treatment Effects on Si(100) Surface and Si(100)/SiO_3 Interface
Analysis of Si-H, Si-O-H and Si-O-O-H Defects in SiO_2 Thin Film by Molecular Orbital Method
Theoretical Analysis of Hydrogen-Related Defects in SiO_2 Thin Film by Molecular Orbital Method
Fabrication of Lead Titanate Thin Film by Laser Ablation with Alternate Deposition of Lead Oxide and Titanium Oxide Precursors ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
Preferentially (105)-Oriented SrBi2Ta2O9 Films Prepared by Laser Ablation Method
Thermal and Electric Field Broadening in Electro-Optical Effect
Electroreflectance in GaAs near the Fundamental Edge at 25°K
Characterization of Charged Traps near Si-SiO_2 Interface in Photo-Induced Chemical Vapor Deposited SiO_2 Film
Characterization of Charged Traps near Si-SiO_2 Interface in Photo-CVD SiO_2 Film
Preparation of Bismuth Titanate Thin Films by Laser Ablation
Preparation of SrBi_2Ta_2O_9 Films by Laser Ablation Method
Bi_4Ti_3O_ Films Grown on SiO_2/Si at Low Temperature by Laser Ablation Method
Theoretical Analysis of Oxygen-Excess Defects in SiO_2 Thin Film by Molecular Orbital Method
Photoluminescence and Its Excimer Laser Irradiation Effects in SiO_2 Film Prepared by Photo-Induced Chemical Vapor Deposition
Theoretical Analysis of Oxygen-Excess Defects in SiO2 Thin Film by Molecular Orbital Method
Growth of SiO_2 Thin Film by Selective Excitation Photo-CVD Using 123.6 nm VUV Light : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)
Growth of Oriented Si Film on Quartz from Si_3H_8 by thermal and Photo-CVD Using a D_2 Lamp : Surfaces, Interfaces and Films
SiO_2 Thin Film Prepared from Si_3H_8 and O_2 by Photo-CVD Using Double Excitation
Preparation of SiO_2 Film by Photo-Induced Chemical Vapor Deposition Using a Deuterium Lamp and Its Annealing Effect
Low Temperature Growth of SiO_2 Thin Film by Double-Excitation Photo-CVD
Photo-Induced Chemical Vapor Deposition of SiO_2 Film Using Direct Excitation Process by Deuterium Lamp

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