Lee D‐h | Yonsei Univ. Seoul Kor
スポンサーリンク
概要
関連著者
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Lee D‐h
Yonsei Univ. Seoul Kor
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Lee Deok-hyung
Process Development Team Memory Division Semiconductor Business Samsung Electronics Co. Ltd.
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Kim H‐s
Sung Kyun Kwan Univ. Suwon Kor
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Kim H‐s
Hynix Semiconductor Inc. Kyoungki‐do Kor
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Ahn Jong-hyon
Cpu Technology Team Samsung Electronics Co. Ltd.
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Suh Kwang-pyuk
Cpu Technology Team Samsung Electronics Co. Ltd.
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Lee S‐c
National Taiwan Univ. Taipei Twn
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Lee Shih-chang
Department Of Electrophysics National Chiao Tung University
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Lee S‐c
Hyundai Electronics Ind. Co. Ltd. Kyoungki‐do Kor
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KIM Hyun-Sik
CPU Technology Team, Samsung Electronics Co., Ltd.
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LEE Duk-Min
CPU Technology Team, Samsung Electronics Co., Ltd.
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LEE Soo-Cheol
CPU Technology Team, Samsung Electronics Co., Ltd.
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Hamakawa Yoshihiro
Faculty Of Science And Engineering Ritsumeikan University
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Hamakawa Yoshihiro
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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OKUYAMA Masanori
Department of Electrical Engineering, Facully of Engineering Science, Osaka University
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Imai T
Itami Research Laboratories Sumitomo Electric Industries Ltd.
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Okuyama Masanori
Department Of Electrical Engineering Faculty Of Engineering Schience Osaka University
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Okuyama Masanori
Faculty Of Engineering Science Osaka University
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Imai T
Nippon Telegraph And Telephone Corp. Ibaraki Jpn
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Okuyama M
Osaka Univ. Osaka Jpn
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ASANO Jun-ichi
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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IMAI Tadayuki
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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LEE Don-Hee
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Yoo Kwang-dong
Cpu Technology Team Samsung Electronics Co. Ltd.
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Hamakawa Y
Faculty Of Science And Engineering Ritsumeikan University
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Asano Jun-ichi
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Hamakawa Yoshihiro
Department Of Electrical Engineering Faculty Of Engineering Osaka University
著作論文
- Preparation of PbTiO_3 Thin Film on Si by ArF Excimer Baser Ablation
- Device Performance Improvement Based on Transient Enhanced Diffusion Suppression in the Deep Sub-Quarter Micron Scale
- Device Performances Improvement Based on TED Suppression in Deep Sub-Quarter Micron Regime