Preparation of PbTiO_3 Thin Film on Si by ArF Excimer Baser Ablation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-09-30
著者
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Hamakawa Yoshihiro
Faculty Of Science And Engineering Ritsumeikan University
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Hamakawa Yoshihiro
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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OKUYAMA Masanori
Department of Electrical Engineering, Facully of Engineering Science, Osaka University
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Imai T
Itami Research Laboratories Sumitomo Electric Industries Ltd.
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Lee D‐h
Yonsei Univ. Seoul Kor
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Okuyama Masanori
Department Of Electrical Engineering Faculty Of Engineering Schience Osaka University
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Okuyama Masanori
Faculty Of Engineering Science Osaka University
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Imai T
Nippon Telegraph And Telephone Corp. Ibaraki Jpn
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Okuyama M
Osaka Univ. Osaka Jpn
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ASANO Jun-ichi
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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IMAI Tadayuki
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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LEE Don-Hee
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Hamakawa Y
Faculty Of Science And Engineering Ritsumeikan University
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Asano Jun-ichi
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Hamakawa Yoshihiro
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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