Nanoimprint Lithography Using Novolak-Type Photoresist and Soft Mold at Room Temperature
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2004-06-15
著者
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Hamakawa Yoshihiro
Faculty Of Science And Engineering Ritsumeikan University
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MINEMOTO Takashi
College of Science and Engineering, Ritsumeikan University
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TAKAKURA Hideyuki
College of Science and Engineering, Ritsumeikan University
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HAMAKAWA Yoshihiro
College of Science and Engineering, Ritsumeikan University
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Koide Takeshi
College Of Science And Engineering Ritsumeikan University
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Numai Takahiro
College Of Science And Engineering Ritsumeikan University
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