A New Grating Fabrication Method for Phase-Shifted DFB LDs
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概要
- 論文の詳細を見る
A new grating fabrication method for phase-shifted DFB LDs has been developed. This method, which uses a phase-shift layer, exhibits very good reproducibility. The fabrication yield was almost 100%. A cw single-longitudinal-mode(SLM) operation as high as 42 mW was achieved for a 1.55 μm DFB-DC-PBH LD with a λ/8-shifted grating fabricated by this method.
- 社団法人応用物理学会の論文
- 1987-11-20
著者
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NUMAI Takahiro
Opto-Electronics Research Laboratories, NEC Corporation
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YAMAGUCHI Masayuki
Opto-Electronics and High Frequency Device Research Laboratories, NEC Corporation
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Numai Takahiro
College Of Science And Engineering Ritsumeikan University
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Numai Takahiro
Opto-electronics Research Laboratories Nec Corporation
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KOBAYASHI Kohroh
Opto-Electronics Research Labs., NEC Corporation
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Mito Ikuo
Opto-electronics Research Laboratories Nec Corporation
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Kobayashi Kohroh
Opto-electronics Research Laboratories Nec Corporation
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Yamaguchi Masayuki
Opto-electronics Research Laboratories Nec Corporation
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Yamaguchi Masayuki
Opto-electronics And High Frequency Device Research Laboratories Nec Corporation
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KOBAYASHI Kohroh
Opto-Electronics Research Laboratories, NEC Corporation
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