Nanoimprint Lithography Using Novolak Photoresist and Soft Mold at Room Temperature

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概要

• 論文の詳細を見る
• 2004-09-15

著者

• Hamakawa Yoshihiro

  Faculty Of Science And Engineering Ritsumeikan University

• MINEMOTO Takashi

  Faculty of Science and Engineering, Ritsumeikan University

• NUMAI Takahiro

  Ritsumeikan University, College of Science and Engineering

• KOIDE Takeshi

  Ritsumeikan University, College of Science and Engineering

• MINEMOTO Takashi

  Ritsumeikan University, College of Science and Engineering

• TAKAKURA Hideyuki

  Ritsumeikan University, College of Science and Engineering

• HAMAKAWA Yoshihiro

  Ritsumeikan University, College of Science and Engineering

• Hamakawa Y

  Faculty Of Science And Engineering Ritsumeikan University

• Koide Takeshi

  College Of Science And Engineering Ritsumeikan University

• Numai T

  Opto-electronics Research Laboratories Nec Corporation

• Takakura H

  Faculty Of Science And Engineering Ritsumeikan University

• Minemoto Takashi

  Faculty Of Science And Engineering Ritsumeikan University

• Minemoto Takashi

  Ritsumeikan Global Innovation Research Organization (R-GIRO), Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan

• Takakura Hideyuki

  Ritsumeikan University

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