INOUE Kohji | Department of Electrical Engineering, Faculty of Engineering Schience, Osaka University

スポンサーリンク

概要

• 同名の論文著者
• Department of Electrical Engineering, Faculty of Engineering Schience, Osaka Universityの論文著者

関連著者

• Okuyama Masanori

  Department Of Electrical Engineering Faculty Of Engineering Schience Osaka University

• Hamakawa Yoshihiro

  Department Of Electrical Engineering Faculty Of Engineering Osaka University

• INOUE Kohji

  Department of Electrical Engineering, Faculty of Engineering Schience, Osaka University

• Okuyama Masanori

  Faculty Of Engineering Science Osaka University

• Fujiki Noriaki

  Department Of Electrical Engineering Faculty Of Engineering Science Osaka University

• FUJIKI Noriaki

  Department of Electrical Engineering, Faculty of Engineering Science, Osaka University

• Hamakawa Y

  Faculty Of Science And Engineering Ritsumeikan University

• TOYODA Yukio

  Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.

• Toyoda Y

  Chubu Univ. Aichi Jpn

• TOYODA Yoshihiko

  Department of Electrical Engineering, Faculty of Engineering Science, Osaka University

• MICHIMORI Masanori

  Department of Electrical Engineering, Faculty of Engineering Science, Osaka University

• Michimori Masanori

  Department Of Electrical Engineering Faculty Of Engineering Science Osaka University

• Hamakawa Yoshihiro

  Department of Electrical Engineering, Faculty of Engineering Science, Osaka University, Toyonaka, Osaka 560

• Nakatani Yoshiki

  Department of Electrical Engineering, Faculty of Engineering Science, Osaka University, Toyonaka, Osaka 560

• Inoue Kohji

  Department of Electrical Engineering, Faculty of Engineering Science, Osaka University, Toyonaka, Osaka 560

もっと見る 閉じる

著作論文

• Growth of SiO_2 Thin Film by Selective Excitation Photo-CVD Using 123.6 nm VUV Light : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)
• Growth of Oriented Si Film on Quartz from Si_3H_8 by thermal and Photo-CVD Using a D_2 Lamp : Surfaces, Interfaces and Films
• SiO_2 Thin Film Prepared from Si_3H_8 and O_2 by Photo-CVD Using Double Excitation
• Preparation of SiO_2 Film by Photo-Induced Chemical Vapor Deposition Using a Deuterium Lamp and Its Annealing Effect
• Low Temperature Growth of SiO_2 Thin Film by Double-Excitation Photo-CVD
• Highly Oriented Polycrystalline Si Film on Quartz Grown from Si3H8 by Thermal and Photo-CVD

スポンサーリンク