Highly Oxidation-Resistant TiN Barrier Layers for Ferroelectric Capacitors

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-03-30

著者

• FUJISAKI Yoshihisa

  Central Research Laboratory, Hitachi Ltd.

• MIKI Hiroshi

  Department of Pathology, Kagawa Medical University

• Matsui Yasushi

  Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat

• MATSUI Yuichi

  Central Research Laboratory, Hitachi, Ltd.

• TORII Kazuyoshi

  Central Research Laboratory, Hitachi, Ltd.

• Torii K

  Central Research Laboratory Hitachi Ltd.

• Torii Kazuyoshi

  Central Research Laboratory Hitachi Lid.

• Torii K

  Semiconductor Leading Edge Technol. Inc. Tsukuba-shi Jpn

• Muto Y

  The Institute For Materials Research Tohoku University

• Miura H

  Hitachi Ltd. Tsuchiura‐shi Jpn

• Miki Hiroshi

  Central Research Laboratory Hitachi Ltd.

• KUSHIDA Keiko

  Central Research Lab., Hitachi, Lid.

• Kushida‐abdelghafar K

  The Authors Are With Central Research Laboratory Hitachi Ltd.

• Fujisaki Y

  R&d Association For Future Electron Devices

• Fujisaki Yoshihisa

  Central Research Laboratory Hitachi Limited

• Miki Hiroshi

  Central Research Laboratory Hitachi Limited

• Fujisaki Yoshihisa

  R&D Association for Future Electron Devices

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