A TiO2 Gate Insulator of a 1-nm Equivalent Oxide Thickness Deposited by Electron-Beam Evaporation
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概要
- 論文の詳細を見る
- 1999-09-20
著者
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TORII Kazuyoshi
Central Research Laboratory, Hitachi, Ltd.
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ONAI Takahiro
Central Research Laboratory, Hitachi, Ltd.
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Onai Takahiro
Central Research Laboratory Hitachi Ltd.
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Torii Kazuyoshi
Central Research Laboratory Hitachi Lid.
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Torii Kazuyoshi
Central Research Laboratory Hitachi Ltd.
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Yugami Jiro
Central Research Laboratory Hitachi Ltd.
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Yugami Jiro
Central Research Laboratory
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HARAGUCHI Keiichi
Central Research Laboratory, Hitachi, Ltd.
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Haraguchi Keiichi
Central Research Laboratory Hitachi Ltd.
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