Test Structure and Experimental Analysis of Emitter-Base Reverse Voltage Stress Degradation in Self-Aligned Bipolar Transistors (Special Issue on Microelectronic Test Structure)
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概要
- 論文の詳細を見る
The degradation of I-V characteristics under constant emitter-base reverse voltage stress in advanced self-aligned bipolar transistors was analyzed. Experimental analyses have been taken the stress field effect into account when predicting hot-carrier degradation. These analyses showed that base current starts to increase when the reverse voltage stress is about 3 V. The dependence of the base current change on reverse voltages of more than 3 V was also investigated experimentally, and equations expressing hot-carrier degradation in terms of the exponential dependence of excess base current on both reverse stress voltage and stress-enhancing voltage related to emitter-base breakdown voltage were derived.
- 社団法人電子情報通信学会の論文
- 1996-02-25
著者
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ONAI Takahiro
Central Research Laboratory, Hitachi, Ltd.
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Nakamura T
Fujitsr Ltd. Akiruno-shi Jpn
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SHIMAMOTO Hiromi
Musashino Office, Hitachi Device Engineering, Co., Ltd.
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TANABE Masamichi
Musashino Office, Hitachi Device Engineering, Co., Ltd.
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WASHIO Katsuyoshi
Central Research Laboratory, Hitachi, Ltd.
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NAKAMURA Tohru
Central Research Laboratory, Hitachi, Ltd.
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Shimamoto H
Musashino Office Hitachi Device Engineering Co. Ltd.
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Shimamoto Hiromi
Musashino Office Hitachi Device Engineering Co. Ltd.
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Tanabe Masamichi
Musashino Office Hitachi Device Engineering Co. Ltd.
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Washio K
Central Research Laboratory Hitachi Ltd.
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Washio Katsuyoshi
Central Research Laboratory Hitachi Ltd.
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Onai T
Central Research Laboratory Hitachi Ltd.
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Onai Takahiro
Central Research Laboratory Hitachi Ltd.
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Nakamura Tohru
Central Research Lab. Hitachi Ltd.
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