Electro-Luminescence from Ultra-Thin Silicon
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概要
- 論文の詳細を見る
Ultra-thin single crystal silicon with the (100) surface formed by the local-oxidation-of-silicon (LOCOS) on a silicon-on-insulator (SOI) substrate becomes a quasi-direct band-gap semiconductor due to the quantum mechanical confinement effect. The device is a simple pn diode in a planar structure. Electro-luminescence (EL) has been observed by the lateral carrier injections into the two-dimensional quantum well.
- 2006-07-25
著者
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Arai Tadashi
Central Research Laboratory Hitachi Ltd.
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MATSUI Yuichi
Central Research Laboratory, Hitachi, Ltd.
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Shimizu Haruka
Central Research Laboratory Hitachi Ltd.
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Onai Takahiro
Central Research Laboratory Hitachi Ltd.
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Sugii Nobuyuki
Central Research Laboratory Hitachi Ltd.
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Torii Kazuyoshi
Central Research Laboratory Hitachi Lid.
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Mine Toshiyuki
Central Research Laboratory Hitachi Ltd
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Hisamoto Digh
Central Research Laboratory Hitachi Ltd.
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Tsuchiya Ryuta
Central Research Laboratory Hitachi Ltd.
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Hamamura Hirotaka
Central Research Laboratory Hitachi Ltd.
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Saito Shinichi
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Sugii Nobuyuki
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Shimizu Haruka
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Hamamura Hirotaka
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Arai Tadashi
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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