Stress Analysis of Transistor Structures Considering the Internal Stress of Thin Films
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概要
- 論文の詳細を見る
Stress fields in transistor structures are analyzed with consideration of the internal stresses of thin films. Internal stresses of amorphous silicon and tungsten silicide films are measured by detecting changes in the surface curvature of film-covered substrates as a function of temperature. Internal stresses of both films change upon annealing due to phase transitions, and reach about 1000 MPa. The stress predicted for transistor structures without considering the internal stress of the films differs markedly from results obtained using microscopic Raman spectroscopy. On the other hand, the stress predicted with consideration of film internal stress agrees very well with measured data. Stress design is performed for an actual transistor structure by adjusting the annealing temperature depending on the internal stress of an amorphous silicon thin film to eliminate the generation of dislocations. It is confirmed that stress design is effective in eliminating dislocations in transistor structures, thus improving device reliability.
- 一般社団法人日本機械学会の論文
- 1996-04-15
著者
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Ohta H
Okayama Univ. Dental School Okayama Jpn
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IKEDA Shuji
Semiconductor & Integrated Circuits Division, Hitachi Ltd.
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Ikeda Shuji
Semiconductor And Integrated Circuit Division Hitachi Ltd.
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Ikeda Shuji
Semiconductor & Integrated Circuits Div. Hitachi Ltd.
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MIURA Hideo
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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ISHITSUKA Norio
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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MIKI Hiroshi
Department of Pathology, Kagawa Medical University
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Ohta H
Ibaraki Univ. Coll. Agriculture Ibaraki Jpn
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Saito Naoto
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Miura H
Hitachi Ltd. Tsuchiura‐shi Jpn
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OHTA Hiroyuki
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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HASHIMOTO Chiemi
Semiconductor & Integrated Circuits Div., Hitachi, Ltd.,
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Ishitsuka N
Hitachi Ltd. Ibaraki Jpn
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Ishitsuka Norio
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Hashimoto Chiemi
Semiconductor & Integrated Circuits Div. Hitachi Ltd.
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Ohta Hiroyuki
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Miura Hideo
Mechanical Engineering Research Laboratory Hitachi Lid.
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Miki Hiroshi
Central Research Laboratory Hitachi Limited
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