OHTA Hiroyuki | Mechanical Engineering Research Laboratory, Hitachi, Ltd.
スポンサーリンク
概要
関連著者
-
OHTA Hiroyuki
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
-
Ohta Hiroyuki
Mechanical Engineering Research Laboratory Hitachi Ltd.
-
Ohta H
Okayama Univ. Dental School Okayama Jpn
-
MIURA Hideo
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
-
MIKI Hiroshi
Department of Pathology, Kagawa Medical University
-
Ohta H
Ibaraki Univ. Coll. Agriculture Ibaraki Jpn
-
Miura H
Hitachi Ltd. Tsuchiura‐shi Jpn
-
Miura Hideo
Mechanical Engineering Research Laboratory Hitachi Lid.
-
Miki Hiroshi
Central Research Laboratory Hitachi Limited
-
Saito Naoto
Mechanical Engineering Research Laboratory Hitachi Ltd.
-
Okamoto Noriaki
Mechanical Engineering Research Laboratory Hitachi Ltd.
-
Okamoto Noriaki
Mechanical Engineering Resarch Laboratory Hitachi Ltd.
-
IKEDA Shuji
Semiconductor & Integrated Circuits Division, Hitachi Ltd.
-
SHIMIZU Akihiro
Hitachi ULSI Engineering Corp.
-
Ikeda Shuji
Semiconductor And Integrated Circuit Division Hitachi Ltd.
-
Ikeda Shuji
Semiconductor & Integrated Circuits Div. Hitachi Ltd.
-
ISHITSUKA Norio
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
-
HASHIMOTO Chiemi
Semiconductor & Integrated Circuits Div., Hitachi, Ltd.,
-
SAKATA Hiroshi
Mechanical Engineering Research Laboratory,Hitachi Ltd.,
-
Ishitsuka N
Hitachi Ltd. Ibaraki Jpn
-
Ishitsuka Norio
Mechanical Engineering Research Laboratory Hitachi Ltd.
-
Hashimoto Chiemi
Semiconductor & Integrated Circuits Div. Hitachi Ltd.
-
Kumagai Yukihiro
Mechanical Engineering Research Laboratory Hitachi Lid.
-
Kumagai Yukihiro
Mechanical Engineering Research Laboratory Hitachi Ltd.
-
MIURA HIDEO
Tohoku University
-
Sakata Hiroshi
Mechanical Engineering Research Laboratory Hitachi Ltd.
著作論文
- Stress Analysis of Transistor Structures Considering the Internal Stress of Thin Films
- Stress Analysis in Silicon Substrates during Thermal Oxidation
- Residual Stress in Silicon Substrate with Shallow Trenches on Surface after Local Thermal Oxidation
- Residual Stress Measurement in Silicon Substrates after Thermal Oxidation
- B24-072 STRESS-OPTIMIZATION DESIGN OF A THIN-FILM SEMICONDUCTOR DEVICE