Okamoto Noriaki | Mechanical Engineering Resarch Laboratory Hitachi Ltd.
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概要
関連著者
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Okamoto Noriaki
Mechanical Engineering Resarch Laboratory Hitachi Ltd.
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Okamoto Noriaki
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Ohta H
Okayama Univ. Dental School Okayama Jpn
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MIURA Hideo
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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MIKI Hiroshi
Department of Pathology, Kagawa Medical University
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Ohta H
Ibaraki Univ. Coll. Agriculture Ibaraki Jpn
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Miura H
Hitachi Ltd. Tsuchiura‐shi Jpn
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OHTA Hiroyuki
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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Ohta Hiroyuki
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Miura Hideo
Mechanical Engineering Research Laboratory Hitachi Lid.
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Miki Hiroshi
Central Research Laboratory Hitachi Limited
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Saito Naoto
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Terayama T
Hitachi Ltd. Ibaraki Jpn
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Terayama Takao
Mechanical Engineering Research Laboratory Hitachi Ltd
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SAKATA Hiroshi
Mechanical Engineering Research Laboratory,Hitachi Ltd.,
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HIGASHIMACHI Takao
The Technopolis Foundation, Kumamoto, Applied Electronics Research Center
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EZAWA Yoshitaka
Mechanical Engineering Research Laboratory, Hitachi Ltd.
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AIZAWA Tamio
Mechanical Engineering Research Laboratory, Hitachi Ltd.
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SAKAI Kazuo
Mechanical Engineering Resarch Laboratory, Hitachi Ltd.
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TAMURA Teizou
Tokai Works, Hitachi Ltd.
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Tamura Teizou
Tokai Works Hitachi Ltd.
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Higashimachi Takao
The Technopolis Foundation Kumamoto Applied Electronics Research Center
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Sakata Hiroshi
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Sakai Kazuo
Mechanical Engineering Resarch Laboratory Hitachi Ltd.
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Aizawa Tamio
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Aizawa Tamio
Mechanical Engineering Research Laboratory Hitach Ltd
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Ezawa Yoshitaka
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Terayama Takao
Mechanical Engineering Resarch Laboratory Hitachi Ltd.
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OKAMOTO Noriaki
Mechanical Engineering Research Laboratory, Hitachi Ltd.
著作論文
- Stress Analysis in Silicon Substrates during Thermal Oxidation
- Residual Stress in Silicon Substrate with Shallow Trenches on Surface after Local Thermal Oxidation
- Residual Stress Measurement in Silicon Substrates after Thermal Oxidation
- High Accurate Boundary Element Method and Its Application to Structure Analysis
- Contact Analysis Between Magnetic Heads and Magnetic Tapes of Video Cassette Recorders : (Analysis with Infinite-Width Heads)