Control of X-Ray Beam Fluctuation in Synchrotron Radiation Lithography Beamline
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-10-15
著者
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MARUMOTO Kenji
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Marumoto K
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Marumoto Kenji
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Ozaki Y
Ntt Kanagawa Jpn
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SHIMANO Hiroki
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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OZAKI Yoshihiko
Industrial Electronics & System Laboratory, Mitsubishi Electric Corporation
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TANAKA Hirofumi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Shimano H
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Tanaka Hirofumi
Advanced Electrotechnology Department Central Research Laboratory Mitsubishi Electric Corporation
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SHIMANO Hiroki
Advanced Technology R&D Center, Mitsubishi Electric Corporation
関連論文
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- A Principle of Deposition of Ultra Low and Uniform Stress Absorber for X-Ray Mask
- Fine Pattern Etching of W-Ti Absorber for X-Ray Mask with Electron Cyclotron Resonance Discharge Plasmas
- X-Ray Mask Fabrication Process Using Cr Mask and ITO Stopper in the Dry Etching of W Absorber
- Analysis of Overlay Accuracy in 0.14μm Device Fabrication using Synchrotron Radiation Lithography
- Evaluation of Acid Diffusibility in a Chemical Amplification Resist Using Acidic Water-Soluble Film
- Defect Printability for 100 nm Patterns in X-Ray Lithography
- 50 nm Pattern Printing by Narrowband Proximity X-Ray Lithography
- Studies on Defect Inspectability and Printability Using Programmed-Defect X-Ray Mask
- A New Cleaning Technique for X-Ray Masks in Alkaline Solutions by Direct Control of Electrochemical Potential
- Proximity Effect Correction for 1:1 X-Ray Mask Fabrication
- Sputtered W-Ti Film for X-Ray Mask Absorber
- Fabrication of Diamond Membranes for X-Ray Masks by Hot-Filament Method
- Stress Stability of W-Ti X-Ray Absorber in Patterning Process
- An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks
- Validity of Double and Triple Gaussian Functions for Proximity Effect Correction in X-ray Mask Writing
- Influence of Optical Parameters of Synchrotron Radiation Lithography Beamline on Pattern Replication
- Electron Beam Writing Techniques for Fabricating Highly Accurate X-Ray Masks
- Control of X-Ray Beam Fluctuation in Synchrotron Radiation Lithography Beamline
- Improvement of Pattern and Position Accuracies by Multiple Electron Beam Writing for X-Ray Mask Fabrication
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