Marumoto Kenji | Advanced Technology R&d Center Mitsubishi Electric Corporation

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概要

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著作論文

A Principle of Deposition of Ultra Low and Uniform Stress Absorber for X-Ray Mask
Analysis of Overlay Accuracy in 0.14μm Device Fabrication using Synchrotron Radiation Lithography
Evaluation of Acid Diffusibility in a Chemical Amplification Resist Using Acidic Water-Soluble Film
50 nm Pattern Printing by Narrowband Proximity X-Ray Lithography
A New Cleaning Technique for X-Ray Masks in Alkaline Solutions by Direct Control of Electrochemical Potential
Stress Stability of W-Ti X-Ray Absorber in Patterning Process
Validity of Double and Triple Gaussian Functions for Proximity Effect Correction in X-ray Mask Writing
Influence of Optical Parameters of Synchrotron Radiation Lithography Beamline on Pattern Replication
Electron Beam Writing Techniques for Fabricating Highly Accurate X-Ray Masks
Control of X-Ray Beam Fluctuation in Synchrotron Radiation Lithography Beamline
An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks
Theoretical Analysis on Mechanical Deformation of Membrane-Based Photomask Blanks
A Principle of Deposition of Ultra Low and Uniform Stress Absorber for X-Ray Mask

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