A New Cleaning Technique for X-Ray Masks in Alkaline Solutions by Direct Control of Electrochemical Potential

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A Principle of Deposition of Ultra Low and Uniform Stress Absorber for X-Ray Mask
Analysis of Overlay Accuracy in 0.14μm Device Fabrication using Synchrotron Radiation Lithography
Evaluation of Acid Diffusibility in a Chemical Amplification Resist Using Acidic Water-Soluble Film
50 nm Pattern Printing by Narrowband Proximity X-Ray Lithography
Etching for 0.15-μm-Level Patterns with Low Microloading Effect Using Beam Plasmas Generated by Gas Puff Plasma Sources
A New Cleaning Technique for X-Ray Masks in Alkaline Solutions by Direct Control of Electrochemical Potential
Stress Stability of W-Ti X-Ray Absorber in Patterning Process
An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks
Validity of Double and Triple Gaussian Functions for Proximity Effect Correction in X-ray Mask Writing
Influence of Optical Parameters of Synchrotron Radiation Lithography Beamline on Pattern Replication
Electron Beam Writing Techniques for Fabricating Highly Accurate X-Ray Masks
Control of X-Ray Beam Fluctuation in Synchrotron Radiation Lithography Beamline
Mechanisms for Microscopic Nonuniformity in Low-Pressure, High-Density Plasma Etching of Poly-Si in Cl_2 and Cl_2/O_2 Mixtures
Profile Evolution during Pulsed Plasma Etching
Effects of O2 Addition on BCl3/Cl2 Plasma Chemistry for Al Etching
Observation of Microscopic Nonuniformity during Overetch in Polysilicon Gate Etching
An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks
Theoretical Analysis on Mechanical Deformation of Membrane-Based Photomask Blanks
Highly Selective Removal of Residual Deposited Films and Oxide Hard Masks on Polysilicon Gate Electrodes in Anhydrous HF Gases
Profile Evolution during Cold Plasma Beam Etching of Silicon
A Principle of Deposition of Ultra Low and Uniform Stress Absorber for X-Ray Mask

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