An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1998-05-01
著者
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KITAMURA Kaeko
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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YABE Hideki
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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KISE Koji
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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AYA Sunao
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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MARUMOTO Kenji
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Marumoto K
Advanced Technology R&d Center Mitsubishi Electric Corporation
関連論文
- A Principle of Deposition of Ultra Low and Uniform Stress Absorber for X-Ray Mask
- Fine Pattern Etching of W-Ti Absorber for X-Ray Mask with Electron Cyclotron Resonance Discharge Plasmas
- X-Ray Mask Fabrication Process Using Cr Mask and ITO Stopper in the Dry Etching of W Absorber
- Analysis of Overlay Accuracy in 0.14μm Device Fabrication using Synchrotron Radiation Lithography
- Evaluation of Acid Diffusibility in a Chemical Amplification Resist Using Acidic Water-Soluble Film
- Defect Printability for 100 nm Patterns in X-Ray Lithography
- Pattern Resolution in X-ray Lithography Using Pattern Replication Technique on a Mask
- 50 nm Pattern Printing by Narrowband Proximity X-Ray Lithography
- Studies on Defect Inspectability and Printability Using Programmed-Defect X-Ray Mask
- A New Cleaning Technique for X-Ray Masks in Alkaline Solutions by Direct Control of Electrochemical Potential
- Proximity Effect Correction for 1:1 X-Ray Mask Fabrication
- Sputtered W-Ti Film for X-Ray Mask Absorber
- Fabrication of Diamond Membranes for X-Ray Masks by Hot-Filament Method
- Stress Stability of W-Ti X-Ray Absorber in Patterning Process
- An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks
- Validity of Double and Triple Gaussian Functions for Proximity Effect Correction in X-ray Mask Writing
- Influence of Optical Parameters of Synchrotron Radiation Lithography Beamline on Pattern Replication
- Electron Beam Writing Techniques for Fabricating Highly Accurate X-Ray Masks
- Control of X-Ray Beam Fluctuation in Synchrotron Radiation Lithography Beamline
- Improvement of Pattern and Position Accuracies by Multiple Electron Beam Writing for X-Ray Mask Fabrication
- Characterization of Solid Oxide Fuel Cell Components by Gas Permeability Measurement
- An Ultralow Stress Ta_4B Absorber for X-Ray Masks
- An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks