Improvement of Pattern and Position Accuracies by Multiple Electron Beam Writing for X-Ray Mask Fabrication
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-11-15
著者
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MATSUI Yasuji
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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MARUMOTO Kenji
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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YABE Hideki
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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AYA Sunao
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Aya S
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Yabe H
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Marumoto K
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Matsui Yasuji
O Ntt Lsi Laboratories
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Matsui Yasuji
Semiconductor Research Laboratory Mitsubishi Electric Corporation
関連論文
- Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication
- Preparation of (Ba, Sr)TiO_3 Thin Films by Chemical Vapor Deposition Using Liquid Sources
- A Principle of Deposition of Ultra Low and Uniform Stress Absorber for X-Ray Mask
- Fine Pattern Etching of W-Ti Absorber for X-Ray Mask with Electron Cyclotron Resonance Discharge Plasmas
- X-Ray Mask Fabrication Process Using Cr Mask and ITO Stopper in the Dry Etching of W Absorber
- Analysis of Overlay Accuracy in 0.14μm Device Fabrication using Synchrotron Radiation Lithography
- Evaluation of Acid Diffusibility in a Chemical Amplification Resist Using Acidic Water-Soluble Film
- Defect Printability for 100 nm Patterns in X-Ray Lithography
- Performance of X-Ray Stepper for Next-Generation Lithography
- 50 nm Pattern Printing by Narrowband Proximity X-Ray Lithography
- Studies on Defect Inspectability and Printability Using Programmed-Defect X-Ray Mask
- Proximity Effect Correction for 1:1 X-Ray Mask Fabrication
- Sputtered W-Ti Film for X-Ray Mask Absorber
- Fabrication of Diamond Membranes for X-Ray Masks by Hot-Filament Method
- Stress Stability of W-Ti X-Ray Absorber in Patterning Process
- An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks
- Validity of Double and Triple Gaussian Functions for Proximity Effect Correction in X-ray Mask Writing
- Influence of Optical Parameters of Synchrotron Radiation Lithography Beamline on Pattern Replication
- Electron Beam Writing Techniques for Fabricating Highly Accurate X-Ray Masks
- Control of X-Ray Beam Fluctuation in Synchrotron Radiation Lithography Beamline
- Improvement of Pattern and Position Accuracies by Multiple Electron Beam Writing for X-Ray Mask Fabrication
- Characterization of Solid Oxide Fuel Cell Components by Gas Permeability Measurement
- Effect of Electron Beam Orbit Distortion on Optical Performance of the Synchrotron Radiation Lithography Beamline