Effect of Electron Beam Orbit Distortion on Optical Performance of the Synchrotron Radiation Lithography Beamline

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概要

• 論文の詳細を見る

• We have investigated the effect of the synchrotron radiation (SR) source drifts, namely, the source position and emission angle, caused by electron beam closed orbit distortion (COD) on optical performance of the beamline such as the exposure field size, the illumination intensity and the uniformity. We theoretically derived that SR source drifts should be controlled within ±0.4 mm and ±0.2 mrad for the position and emission angle drifts, respectively, to obtain uniformity better than 15% for our beamline. We also propose a new technique to directly measure the SR source drifts using the focusing property of the mirror and the SR beam monitor installed in the beamline, which can be applied to predict the changes of optical performance of the beamline, and to monitor the electron beam drifts for correcting COD.

• 社団法人応用物理学会の論文
• 1994-12-30

著者

• Asano Kazuo

  Semiconductor Research Laboratory Mitsubishi Electric Corporation

• MATSUI Yasuji

  Semiconductor Research Laboratory, Mitsubishi Electric Corporation

• Matsui Yasuji

  Semiconductor Research Laboratory Mitsubishi Electric Corporation

• Shimano Hiroki

  Semiconductor Research Laboratory Mitsubishi Electric Corporation

• OZAKI Yoshihiko

  Semiconductor Research Laboratory, Mitsubishi Electric Corporation

• Ozaki Yoshihiko

  Semiconductor Research Laboratory Mitsubishi Electric Corporation

関連論文

• Preparation of (Ba, Sr)TiO_3 Thin Films by Chemical Vapor Deposition Using Liquid Sources
• Fine Pattern Etching of W-Ti Absorber for X-Ray Mask with Electron Cyclotron Resonance Discharge Plasmas
• Proximity Effect Correction for 1:1 X-Ray Mask Fabrication
• Improvement of Pattern and Position Accuracies by Multiple Electron Beam Writing for X-Ray Mask Fabrication
• Effect of Electron Beam Orbit Distortion on Optical Performance of the Synchrotron Radiation Lithography Beamline

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