Sumitani Hiroaki | Advanced Technology R&d Center Mitsubishi Electric Corp.

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概要

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著作論文

Analysis of Overlay Accuracy in 0.14μm Device Fabrication using Synchrotron Radiation Lithography
Evaluation of Acid Diffusibility in a Chemical Amplification Resist Using Acidic Water-Soluble Film
Alignment Mark Optimization to Reduce Tool- and Wafer-Induced Shift for XRA-1000
Pattern Resolution in X-ray Lithography Using Pattern Replication Technique on a Mask
50 nm Pattern Printing by Narrowband Proximity X-Ray Lithography
Critical Dimension Control in Synchrotron Radiation Lithography Using a Negative-Tone Chemical Amplification Resist
Mechanisms of X-Ray Radiation-Induced Damage in (Ba, Sr)TiO_3 Capacitors
Mechanisms of Synchrotron X-Ray Irradiation-Induced Damage in (Ba, Sr)TiO_3 Capacitors
4H-SiC Power Metal–Oxide–Semiconductor Field Effect Transistors and Schottky Barrier Diodes of 1.7 kV Rating
Critical Dimension Control in Synchrotron Radiation Lithography Using a Negative-Tone Chemical Amplification Resist
Theoretical Analysis on Mechanical Deformation of Membrane-Based Photomask Blanks
High Aspect Pattern Fabrication by Nano Imprint Lithography Using Fine Diamond Mold

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