Critical Dimension Control in Synchrotron Radiation Lithography Using a Negative-Tone Chemical Amplification Resist
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-12-30
著者
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WATANABE Hiroshi
Advanced Science Research Center, Japan Atomic Energy Research Institute
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SUITA Muneyoshi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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HIFUMI Takashi
Advanced Technology R&D Center, Mitsubishi Electric Corp.
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SUMITANI Hiroaki
Advanced Technology R&D Center, Mitsubishi Electric Corp.
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ITOGA Kenji
Advanced Technology R&D Center, Mitsubishi Electric Corp.
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Watanabe H
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Watanabe Hiroshi
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies(aset) At
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OGUSHI Nobuaki
Nanotechnology Research Center, Canon Inc.
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MIZUSAWA Nobutoshi
Nanotechnology Research Center, Canon Inc.
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UDA Koji
Nanotechnology Research Center, Canon Inc.
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Uda Koji
Nanotechnology Research Center Canon Inc.
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Itoga Kenji
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Hifumi T
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Ogushi Nobuaki
Nanotechnology Research Center Canon Inc.
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Watanabe H
Tokyo Univ. Pharmacy And Life Sci. Tokyo Jpn
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Suita Muneyoshi
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Sumitani H
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Sumitani Hiroaki
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Mizusawa Nobutoshi
Nanotechnology Research Center Canon Inc.
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Watanabe Hiroshi
Advanced Lsi Technology Labs Toshiba Corp.
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Hifumi Takashi
Advanced Technology R&D Center, Mitsubishi Electric Corp.
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