High Aspect Pattern Fabrication by Nano Imprint Lithography Using Fine Diamond Mold
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概要
- 論文の詳細を見る
Fabrication of high aspect ratio patterns with an aspect ratio larger than 10 is attempted by nano imprint lithography. A fine mold using a chemical vapor deposition (CVD) diamond layer is newly developed by electron cyclotron resonance (ECR) using Cl2-O2 gas. Narrow grooves less than 100 nm in width and 1.0 μm in depth are successfully obtained. Using medium molecular weight PMMA ($M_{\text{w}}=350$ k) and with slow advance of the cooling sequence in the imprint process, the fatal error of the polymer fracture is eliminated at the mold release process. Based on the advanced process, we first demonstrate the fabrication of high aspect ratio patterns over 20 with 80 nm line width, however, the polymer might be stretched during the mold release process.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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Sasaki Kei
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Yabe Hideki
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Hirai Yoshihiko
College Of Engineering Osaka Prefecture Univirsity
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Sumitani Hiroaki
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Tanaka Yoshio
College Of Engineering Graduate School Of Osaka Prefecture University
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Yabe Hideki
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki, Hyogo 661-8661, Japan
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Yoshida Satoshi
College of Engineering, Graduate School of Osaka Prefecture University, 1-1 Gakuencho, Sakai, Osaka 539-8531, Japan
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Takagi Nobuyuki
College of Engineering, Graduate School of Osaka Prefecture University, 1-1 Gakuencho, Sakai, Osaka 539-8531, Japan
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Yamamoto Kazuhiro
Material Technology Department, Technology Research Institute of Osaka Prefecture, 2-7-1 Ayumino, Izumi, Osaka 594-1157, Japan
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Hirai Yoshihiko
College of Engineering, Graduate School of Osaka Prefecture University, 1-1 Gakuencho, Sakai, Osaka 539-8531, Japan
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Sumitani Hiroaki
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki, Hyogo 661-8661, Japan
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Sasaki Kei
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki, Hyogo 661-8661, Japan
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Tanaka Yoshio
College of Engineering, Graduate School of Osaka Prefecture University, 1-1 Gakuencho, Sakai, Osaka 539-8531, Japan
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