Reduction of Accumulation Thickness in Metal Gate
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概要
- 論文の詳細を見る
- 2005-09-13
著者
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Saito Tomohiro
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Nakajima Kazuaki
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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WATANABE Hiroshi
Advanced Science Research Center, Japan Atomic Energy Research Institute
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Matsuo Kouji
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Kobayashi Takuya
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Nakajima Kazuaki
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Watanabe Hiroshi
Advanced Lsi Technology Labs Toshiba Corp.
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