Nakajima Kazuaki | Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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概要
- NAKAJIMA Kazuakiの詳細を見る
- 同名の論文著者
- Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.の論文著者
関連著者
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Nakajima Kazuaki
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Nakajima Kazuaki
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Matsuo Kouji
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Suguro Kyoichi
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Saito Tomohiro
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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SUGURO Kyoichi
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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WATANABE Hiroshi
Advanced Science Research Center, Japan Atomic Energy Research Institute
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TSUNASHIMA Yoshitaka
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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Kobayashi Takuya
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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YAGISHITA Atsushi
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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Nakajima Kensuke
Research Institute Of Electrical Communication Tohoku University
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Tsunashima Yoshitaka
Process & Manufacturing Center Semiconductor Company Toshiba Corporation
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Tsunashima Yoshitaka
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Koyama Masato
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Yano H
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Suguro K
Toshiba Corporation Semiconductor Company
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AOYAMA Tomonori
Process & Manufacturing Center, Semiconductor Company, Toshiba Corporation
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SEKINE Katsuyuki
Process & Manufacturing Center, Semiconductor Company, Toshiba Corporation
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EGUCHI Kazuhiro
Process & Manufacturing Center, Semiconductor Company, Toshiba Corporation
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SUGURO Tomohiro
process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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Yagishita A
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Matsuo K
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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OMOTO Seiichi
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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NAKAMURA Shinichi
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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MINAMIHABA Gaku
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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YANO Hiroyuki
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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Nakamura S
Univ. California California Usa
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Omoto Seiichi
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Minamihaba Gaku
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Sekine Katsuyuki
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Suguro Kyoichi
Toshiba Corporation Semiconductor Company
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Watanabe Hiroshi
Advanced Lsi Technology Labs Toshiba Corp.
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TSUNASHIMA Yoshitaka
Process & Manufactruing Engineering Center, Semiconductor Company, Toshiba Corporation
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Nakajima Kazuaki
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Koyama Masato
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
著作論文
- Reduction of Accumulation Thickness in Metal Gate
- Low-Standby-Power Complementary Metal-Oxide-Semiconductor Transistors with TiN Single Gate on 1.8 nm Gate Oxide
- Low Leakage TiO_2 Gate Insulator Formed by Ultrathin TiN Deposition and Low-Temperature Oxidation
- Work Function Modulation by Segregation of Indium through Tungsten Gate for Dual-Metal-Gate Complementary Metal Oxide Semiconductor Applications