HORIKAWA Tsuyoshi | Advanced Technology R&D Center, Mitsubishi Electric Corporation
スポンサーリンク
概要
関連著者
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Yamamuka M
Mitsubishi Electric Corp. Hyogo Jpn
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Kawahara T
Semiconductor Leading Edge Technol. Inc. Tsukuba-shi Jpn
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KAWAHARA Takaaki
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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HORIKAWA Tsuyoshi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Horikawa Tsuyoshi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Kawahara Takaaki
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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斧 高一
京都大学大学院工学研究科
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Ono K
Department Of Applied Chemistry The University Of Tokyo
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Ono K
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae
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Ono K
Univ. California Ca Usa
著作論文
- Measurement of Atomic Incorporation Rates and Modeling of Surface Reactions in (Ba,Sr)TiO_3 Films Prepared by a Liquid Source Chemical Vapor Deposition
- Conformal Step Coverage of (Ba,Sr)TiO_3 Films Prepared by Liquid Source CVD Using Ti(t-BuO)_2(DPM)_2
- Conformal Step Coverage of (Ba,Sr)TiO_3 Films Prepared by Liquid Source CVD Using Ti(t-BuO)_2(DPM)_2
- Mechanisms of X-Ray Radiation-Induced Damage in (Ba, Sr)TiO_3 Capacitors
- Influence of Buffer Layers and Barrier Metals on Properties of (Ba, Sr)TiO_3 Films Prepared by Liquid Source Chemical Vapor Deposition
- Mechanisms of Synchrotron X-Ray Irradiation-Induced Damage in (Ba, Sr)TiO_3 Capacitors
- A Mass Spectrometric Study of Reaction Mechanisms in Chemical Vapor Deposition of (Ba, Sr)TiO_3 Films