Effect of Substrate Bias on Silicon Thin-Film Growth in Plasma-Enhanced Chemical Vapor Deposition at Cryogenic Temperatures

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-06-30

著者

• HIROSE Masataka

  Department of Electrical Engineering, Hiroshima University

• Okamoto Kazuya

  Central Research Laboratory Nikon Corporation

• Miyazaki Seiichi

  Department Of Electrical Engineering Hiroshima University

• Miyazaki Seiichi

  Dept. Of Electrical Engineering Hiroshima University

• Hashimoto M

  Department Of Macromolecular Science And Engineering Graduate School Of Science And Technology Kyoto

• Hashimoto M

  Department Of Polymer Science And Engineering Faculty Of Textile Science Kyoto Institute Of Technolo

• SHIN Hidetoshi

  Department of Electrical Engineering, Hiroshima University

• OKAMOTO Katsuhiko

  Department of Electrical Engineering, Hiroshima University

• Miyazaki Seiichi

  Department Of Electrical Engineering Graduate School Of Advanced Sciences And Matter Hiroshima Unive

• Shin Hidetoshi

  Department Of Electrical Engineering Hiroshima University

• OKAMOTO Kimiharu

  JEOL Limited

• Okamoto K

  Jeol Limited

• Hirose Masataka

  Department Of Electrical Engineering Graduate School Of Advanced Sciences Of Matter Hiroshima Univer

• Hirose Masataka

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• Miyazaki Seiichi

  Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

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