Characterization of Interfacial Oxide Layers in Heterostructures of Hafnium Oxides Formed on NH_3-Nitrided Si(100)
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-11-30
著者
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OHTA Akio
Department of Chemistry and Chemical Engineering, Faculty of Engineering, Kanazawa University
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MURAKAMI Hideki
Department of Geology, Faculty of Science, Kochi University
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Ohta Akiko
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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NAKAGAWA Hiroshi
Department of Pediatrics, Sendai City Hospital
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Miyazaki Seiichi
Department Of Electrical Engineering Hiroshima University
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Murakami Hideki
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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HIGASHI Seiichiro
Department of Semiconductor Electronics and Integration Science, Graduate School of Advanced Science
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TAKENO Fumito
Department of Electrical Engineering, Graduate School of Advanced Sciences of Matter, Hiroshima Univ
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NAGAMACHI Satoru
Department of Electrical Engineering, Graduate School of Advanced Sciences of Matter, Hiroshima Univ
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