Characterization of Interfacial Oxide Layers in Heterostructures of Hafnium Oxides Formed on NH_3-Nitrided Si(100)

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-11-30

著者

• OHTA Akio

  Department of Chemistry and Chemical Engineering, Faculty of Engineering, Kanazawa University

• MURAKAMI Hideki

  Department of Geology, Faculty of Science, Kochi University

• Ohta Akiko

  Graduate School Of Advanced Sciences Of Matter Hiroshima University

• NAKAGAWA Hiroshi

  Department of Pediatrics, Sendai City Hospital

• Miyazaki Seiichi

  Department Of Electrical Engineering Hiroshima University

• Murakami Hideki

  Graduate School Of Advanced Sciences Of Matter Hiroshima University

• HIGASHI Seiichiro

  Department of Semiconductor Electronics and Integration Science, Graduate School of Advanced Science

• TAKENO Fumito

  Department of Electrical Engineering, Graduate School of Advanced Sciences of Matter, Hiroshima Univ

• NAGAMACHI Satoru

  Department of Electrical Engineering, Graduate School of Advanced Sciences of Matter, Hiroshima Univ

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