High Quality a-SiGe:H Alloys Prepared by Nanometer Deposition/H_2 Plasma Annealing Method

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-02-15

著者

• XU Jun

  Department of Physiology and Biophysics, Institute for Computational Biomedicine, Weill Medical Coll

• Xu J

  Institute Of Advanced Materials Fudan University

• HIROSE Masataka

  Department of Electrical Engineering, Hiroshima University

• Hirose Minoru

  Process Development Division Fujitsu Limited

• Miyazaki Seiichi

  Department Of Electrical Engineering Hiroshima University

• Miyazaki Seiichi

  Dept. Of Electrical Engineering Hiroshima University

• Xu Jun

  Liquid Crystal Institute And Graduate School Of Engineering Science Tokyo University Of Science

• Xu J

  Akita Univ. Akita Jpn

• Xu J

  National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn

• Miyazaki Seiichi

  Department Of Electrical Engineering Graduate School Of Advanced Sciences And Matter Hiroshima Unive

• Hirose M

  Materials Research Center Tdk Corporation

• Xu Jun

  Department Of Electrical Engineering Hiroshima University

• Hirose Masataka

  Department Of Electrical Engineering Graduate School Of Advanced Sciences Of Matter Hiroshima Univer

• Xu Jun

  Department Of Bioengineering College Of Life Science And Technology Beijing University Of Chemical T

• Hirose Masataka

  Department Of Electrical Engineering Faculty Of Engineering Hiroshima University

• Miyazaki Seiichi

  Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

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