Formation of Diamond Films by Intermittent Discharge Plasma Chemical Vapor Deposition (<Special Issue> Plasma Processing)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-07-30

著者

• 野田 三喜男

  愛知教大

• Noda M

  Department Of Electronics Fukuoka Institute Of Technology

• TANIGUCHI Kazuya

  Department of Bioresource Science, Graduate School of Agricultural Science, Tohoku University

• Noda Mikio

  Department of Integrated Natural Sciences, Aichi University of Education

• MARUNO Shigemitsu

  The Institute of Scientific and Industrial Research, Osaka University

• Taniguchi Kazuya

  Department Of Applied Chemistry Chuo University

• KUSAKABE Hiroshi

  Department of Electrical and Computer Engineering, Nagoya Institute of Technology

• MARUNO Shigeo

  Department of Electrical and Computer Engineering, Nagoya Institute of Technology

• Maruno S

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Maruno Shigeo

  Department Of Electrical And Computer Engineering Nagoya Institute Of Technology

• Kusakabe Hiroshi

  Department Of Electrical And Computer Engineering Nagoya Institute Of Technology

• Taniguchi Kazuya

  Department Of Electrical And Computer Engineering Nagoya Institute Of Technology

• Maruno Shigemitsu

  Advanced Technology R&D Center. Mitsubishi Electric Corporation

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