Formation of Diamond Films by Intermittent DC Plasma Chemical Vapor Deposition Using Subelectrode

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-07-30

著者

• 野田 三喜男

  愛知教大

• Noda M

  Department Of Electronics Fukuoka Institute Of Technology

• Noda Mikio

  Department of Integrated Natural Sciences, Aichi University of Education

• Narita Masanao

  Institute Of Space And Astronautical Science Japan Aerospace Exploration Agency

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