Characterization of Line-edge Roughness in Cu/low-k Interconnect Pattern
スポンサーリンク
概要
- 論文の詳細を見る
- 2007-09-19
著者
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武田 健一
日立製作所 中央研究所
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河江 達也
九州大工
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Yamaguchi Atsumi
Ulsi Development Center Mitsubishi Electric Corporation
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Takeda Kazuyuki
Department Of Chemistry Graduate School Of Science Kyoto University:(present Address)division Of Adv
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YAMAGUCHI Atsuko
Central Research Laboratory, Hitachi, Ltd.
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YAMAMOTO Jiro
Central Research Laboratory, Hitachi, Ltd.
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Yamaguchi Atsuko
Central Research Laboratory Hitachi Ltd.
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Yamaguchi Atsuko
Association Of Super-advanced Electronics Technologies:(present Address)hitachi Central Laboratory
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Takeda Ken-ichi
Central Research Laboratory Hitachi Ltd.
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Kawada Hiroki
Hitachi High-technologies Corp.
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Yamamoto Jiro
Central Research Laboratory Hitachi Ltd.
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Ryuzaki Daisuke
Central Research Laboratory Hitachi Ltd.
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IIZUMI Takashi
Hitachi High-Technologies Corporation
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Takeda Ken'ichi
Central Research Laboratory Hitachi Ltd.
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Iizumi Takashi
Hitachi High-technologies Corp.
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Takeda Ken-ichi
Central Research Laboratory, Hitachi Ltd., Kokubunji-shi, Tokyo 185-8601, Japan
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Takeda Ken-ichi
Hitachi, Ltd., Central Research Laboratory, 1-280 Higashikoigakubo Kokubunji-shi, Tokyo 185-8601, Japan
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Takeda Ken-ichi
Hitachi, Ltd., Central Research Laboratory, Kokubunji, Tokyo 185-8601, Japan
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Takeda Ken-ichi
Central Research Laboratory, Hitachi Ltd., Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
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Kawada Hiroki
Hitachi High-Technologies Co., Hitachinaka, Ibaraki 312-8504, Japan
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Yamamoto Jiro
Central Research Lab., Hitachi Ltd.
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河江 連也
九大工
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