Fine Pattern Fabrication below 100 nm with 70 kV Cell Projection Electron Beam Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-12-30
著者
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MURAI Fumio
Central Research Laboratory, Hitachi, Ltd
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YAMAMOTO Jiro
Central Research Laboratory, Hitachi, Ltd.
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SOMEDA Yasuhiro
Central Research Laboratory, Hitachi. Ltd.
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Someda Yasuhiro
Central Research Laboratory Hitachi Ltd.
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UCHINO Sho-ichi
Central Research Laboratory, Hitachi, Ltd.
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Uchino Sho-ichi
Central Research Laboratory Hitachi Ltd.
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Murai Fumio
Central Research Laboratory Hitachi Ltd
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Yamamoto Jiro
Central Research Laboratory Hitachi Ltd.
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Murai Fumio
Central Research Lab., Hitachi Ltd.
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Yamamoto Jiro
Central Research Lab., Hitachi Ltd.
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