Fabrication and Operation of Si-Coupled Superconducting FET with 0.1μm Gate : Microfabrication and Physics
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-12-30
著者
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Kure Tokuo
Central Research Laboratory, Hitachi, Ltd.
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Kure Tokuo
Central Research Laboratory Hitachi Ltd
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HATANO Mutsuko
Central Research Laboratory, Hitachi, Ltd
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MURAI Fumio
Central Research Laboratory, Hitachi, Ltd
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NISHINO Toshikazu
Central Research Laboratory, Hitachi, Ltd
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HASEGAWA Haruhiko
Central Research Laboratory, Hitachi, Ltd
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KAWABE Ushio
Central Research Laboratory, Hitachi, Ltd
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Hatano Mutsuko
Central Research Laboratory Hitachi Ltd
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Hasegawa Haruhiko
Central Research Laboratory Hitachi Ltd
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Nishino Toshikazu
Central Research Laboratory Hitachi Ltd
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Murai Fumio
Central Research Laboratory Hitachi Ltd
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Kawabe Ushio
Central Research Laboratory Hitachi Ltd
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Murai Fumio
Central Research Lab., Hitachi Ltd.
関連論文
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- Tungsten Gate Technology for Quarter-Micron Application
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- Fabrication of Less Than a 10 nm Wide Polycrystalline Silicon Nano Wire
- Fabrication and Operation of Si-Coupled Superconducting FET with 0.1μm Gate : Microfabrication and Physics
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