Hatano Mutsuko | Central Research Laboratory Hitachi Ltd
スポンサーリンク
概要
関連著者
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Hatano Mutsuko
Central Research Laboratory Hitachi Ltd
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HATANO Mutsuko
Central Research Laboratory, Hitachi, Ltd
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Nishino Toshikazu
Central Research Laboratory Hitachi Ltd
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Kure Tokuo
Central Research Laboratory, Hitachi, Ltd.
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Kure Tokuo
Central Research Laboratory Hitachi Ltd
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MURAI Fumio
Central Research Laboratory, Hitachi, Ltd
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NISHINO Toshikazu
Central Research Laboratory, Hitachi, Ltd
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HASEGAWA Haruhiko
Central Research Laboratory, Hitachi, Ltd
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KAWABE Ushio
Central Research Laboratory, Hitachi, Ltd
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Takagi Kazumasa
Central Research Laboratory Hitachi Lid.
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OHKURA Makoto
Hitachi Central Research Laboratory
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Hatano Mutsuko
Central Research Laboratory Hitachi Ltd.
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Hasegawa Haruhiko
Central Research Laboratory Hitachi Ltd
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Nishino Toshikazu
Central Research Laboratory Hitachi Ltd.
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Saitoh Kazuo
Central Research Laboratory Hitachi Ltd.
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Murai Fumio
Central Research Laboratory Hitachi Ltd
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Suga M
Shinshu Univ. Ueda Jpn
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Suga Mitsuo
Central Research Laboratory Hitachi Ltd.
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Kawabe Ushio
Central Research Laboratory Hitachi Ltd
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Saito Kazuo
Central Research Laboratory Hitachi Ltd.
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Hatano Mutsuko
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Tai Mitsuharu
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Sato Takeshi
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Matsumura Mieko
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Ohkura Makoto
Hitachi Displays, Ltd., Mobara, Chiba 297-8622, Japan
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Murai Fumio
Central Research Lab., Hitachi Ltd.
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TAKAGI Kazumasa
Central Research Laboratory, Hitachi Ltd.
著作論文
- Fabrication and Operation of Si-Coupled Superconducting FET with 0.1μm Gate : Microfabrication and Physics
- Experiments on Space-Division Multiplexing of Electron Waves in a Solid Using Andreev Reflection at the Si/Nb Boundary
- Observation of Electron-Wave Interference at Semiconductor-Superconductor Boundary : Micro/nanofabrication and Devices
- Post-Annealing Effects on a Laterally Grown Polycrystalline Silicon Layer