Dependence of Time-Dependent Dielectric Breakdown Lifetime on NH_3-Plasma Treatment in Cu Interconnects

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-07-15

著者

• 武田 健一

  日立製作所 中央研究所

• Takeda Ken-ichi

  Central Research Laboratory Hitachi Ltd.

• NOGUCHI Junji

  Micro Device Division, Hitachi, Ltd.

• OHASHI Naofumi

  Semiconductor Leading Edge Technologies, Inc.

• YAMAGUCHI Hizuru

  Renesas Technology Corp.

• Ohashi Naofumi

  Device Development Center Hitachi Ltd.

• Noguchi Junji

  Device Development Center Hitachi Ltd.

• Ohashi Naofumi

  Semiconductor Leading Edge Technologies Inc.

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