Dependence of Time-Dependent Dielectric Breakdown Lifetime on the Structure in Cu Metallization
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-11-15
著者
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OHASHI Naofumi
Semiconductor Leading Edge Technologies, Inc.
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Ohashi Naofumi
Device Development Center Hitachi Ltd.
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NOGUCHI Junji
Hitachi, Ltd., Micro Device Division
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SAITO Tatsuyuki
Hitachi, Ltd., Micro Device Division
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MARUYAMA Hiroyuki
Hitachi, Ltd., Micro Device Division
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KUBO Maki
Hitachi, Ltd., Micro Device Division
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TAKEDA Ken-ichi
Hitachi, Ltd., Central Research Laboratory
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Maruyama Hiroyuki
Hitachi Ltd. Micro Device Division
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Kubo Maki
Device Development Center Hitachi Ltd.
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