Precise Cross-Sectional Measurement of Photoresist Shrinkage Caused by Electron Beam Irradiation (Special Issue : Microprocesses and Nanotechnology)
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Yamaguchi Atsuko
Central Research Laboratory Hitachi Ltd.
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Ohashi Takeyoshi
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Tanaka Junichi
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Kawada Hiroki
Hitachi High-Technologies Co., Hitachinaka, Ibaraki 312-8504, Japan
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Sekiguchi Tomoko
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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- Precise Cross-Sectional Measurement of Photoresist Shrinkage Caused by Electron Beam Irradiation
- Precise Cross-Sectional Measurement of Photoresist Shrinkage Caused by Electron Beam Irradiation (Special Issue : Microprocesses and Nanotechnology)