Structural Analysis for Water Absorption of SiOF Films Prepared by High-Density-Plasma Chemical Vapor Deposition

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1998-05-01

著者

• Satoh Minoru

  Nagaoka University Of Technology

• Satoh M

  Tohoku Univ. Sendai Jpn

• TAMURA Takahiro

  Semiconductor Division, YAMAHA Corporation

• SAKAI Junro

  Semiconductor Equipment Division, Anelva Corporation

• INOUE Yoichi

  Semiconductor Equipment Division, Anelva Corporation

• SATOH Makoto

  Semiconductor Equipment Devision, Anelva Corporation

• YOSHITAKA Hikaru

  Semiconductor Equipment Division, Anelva Corporation

• Iwai Yuki

  Dep. Of Electronics And Bioinformatics Sci. And Technol. Meiji Univ.

• Sakai J

  Mitsubishi Electric Corp. Hyogo Jpn

• Yoshitaka Hikaru

  Semiconductor Equipment Division Anelva Corporation

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