SATOH Makoto | Semiconductor Equipment Devision, Anelva Corporation

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概要

• 同名の論文著者
• Semiconductor Equipment Devision, Anelva Corporationの論文著者

関連著者

• SAKAI Junro

  Semiconductor Equipment Division, Anelva Corporation

• SATOH Makoto

  Semiconductor Equipment Devision, Anelva Corporation

• Satoh Minoru

  Nagaoka University Of Technology

• Satoh M

  Tohoku Univ. Sendai Jpn

• TAMURA Takahiro

  Semiconductor Division, YAMAHA Corporation

• Sakai J

  Mitsubishi Electric Corp. Hyogo Jpn

• Yoshitaka Hikaru

  Semiconductor Equipment Division Anelva Corporation

• YOSHITAKA Hikaru

  Semiconductor Equipment Division, Anelva Corporation

• Iwai Yuki

  Dep. Of Electronics And Bioinformatics Sci. And Technol. Meiji Univ.

• Inoue Yasuo

  Lsi Research & Development Laboratory Mitsubishi Electric Corporation

• Tamura Takao

  Ulsi Device Development Laboratories Nec Corp.

• Satoh Masaharu

  Department Of Electrical Engineering Faculty Of Engineering Osaka University

• Satoh M

  Department Of Physics Faculty Of Science Okayama University

• IZUMI Yoshitaka

  NHK Science and Technical Research Laboratories

• INOUE Yoichi

  Semiconductor Equipment Division, Anelva Corporation

• INOUE Youichi

  Semiconductor Equipment Division, Anelva Corporation

• TAMURA Takahiro

  Process Technology Department, Rohm Hamamatsu Company Limited

• SATOH Makoto

  Semiconductor Equipment Division, Anelva Corporation

• Satoh Makoto

  Semiconductor Equipment Division, Anelva Corporation,

• Inoue Yoichi

  Semiconductor Equipment Division, Anelva Corporation,

• Yoshitaka Hikaru

  Semiconductor Equipment Division, Anelva Corporation,

• Sakai Junro

  Semiconductor Equipment Division, Anelva Corporation,

• Tamura Takahiro

  Semiconductor Division, YAMAHA Corporation,

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著作論文

• Structural Analysis for Water Absorption of SiOF Films Prepared by High-Density-Plasma Chemical Vapor Deposition
• Structural and Electrical Properties for Fluorine-Doped Silicon Oxide Films Prepared by Biased Helicon-Plasma Chemical Vapor Deposition
• Influence of Gas Desorption from SiOF Film Prepared by High-Density-Plasma Chemical Vapor Deposition upon TiN/Ti Film
• Structural and Electrical Properties for Fluorine-Doped Silicon Oxide Films Prepared by Biased Helicon-Plasma CVD
• Characterization of Stable Fluorine-Doped Silicon Oxide Film Prepared by Biased Helicon Plasma Chemical Vapor Deposition
• Structural Analysis for Water Absorption of SiOF Films Prepared by High-Density-Plasma Chemical Vapor Deposition

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