INOUE Youichi | Semiconductor Equipment Division, Anelva Corporation
スポンサーリンク
概要
関連著者
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Satoh Minoru
Nagaoka University Of Technology
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Satoh M
Tohoku Univ. Sendai Jpn
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Inoue Yasuo
Lsi Research & Development Laboratory Mitsubishi Electric Corporation
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Tamura Takao
Ulsi Device Development Laboratories Nec Corp.
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Satoh Masaharu
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Satoh M
Department Of Physics Faculty Of Science Okayama University
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IZUMI Yoshitaka
NHK Science and Technical Research Laboratories
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TAMURA Takahiro
Semiconductor Division, YAMAHA Corporation
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SAKAI Junro
Semiconductor Equipment Division, Anelva Corporation
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SATOH Makoto
Semiconductor Equipment Devision, Anelva Corporation
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YOSHITAKA Hikaru
Semiconductor Equipment Division, Anelva Corporation
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INOUE Youichi
Semiconductor Equipment Division, Anelva Corporation
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Iwai Yuki
Dep. Of Electronics And Bioinformatics Sci. And Technol. Meiji Univ.
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Sakai J
Mitsubishi Electric Corp. Hyogo Jpn
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Yoshitaka Hikaru
Semiconductor Equipment Division Anelva Corporation
著作論文
- Structural and Electrical Properties for Fluorine-Doped Silicon Oxide Films Prepared by Biased Helicon-Plasma CVD
- Characterization of Stable Fluorine-Doped Silicon Oxide Film Prepared by Biased Helicon Plasma Chemical Vapor Deposition