Vacuum Ultraviolet Laser-Induced Surface Alteration of SiO_2

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概要

• 論文の詳細を見る

• Intense vacuum ultraviolet laser radiation is generated from rare gas excimer lasers. 9.8 eV photons from an argon excimer laser change surfaces of SiO_2 to silicon. The reaction proceeds without the aid of reactive gas or solution and is thus called the "superdry process". 9.8 eV photons create excitons via an efficient one-photon absorption process, and then these high-density excitons induce bond-breaking between Si and O.

• 社団法人応用物理学会の論文
• 1991-11-30

著者

• Inoue Yasuo

  Lsi Research & Development Laboratory Mitsubishi Electric Corporation

• Sasaki W

  Department Of Physics Toho University

• TAKIGAWA Yasuo

  Department of Electronics, Osaka Electro-communication University

• KUROSAWA Kou

  Department of Electrical Engineering, Miyazaki University

• SASAKI Wataru

  Department of Electrical Engineering, University of Miyazaki

• Takigawa Yasuo

  Department Of Electronic Engineering Osaka Electro-communication University

• KATTO Masahito

  Department of Electrical and Electronic Engineering and Photon Science Center, University of Miyazak

• IZUMI Yoshitaka

  NHK Science and Technical Research Laboratories

• Kurosawa K

  Jst Satellite Miyazaki

• Kurosawa Kou

  Department Of Electronics University Of Osaka Prefecture

• Kurosawa Kou

  Department Of Electrical And Electronic Engineering University Of Miyazaki

• Sasaki Wataru

  Department Of Electrical And Electronic Engineering And Photon Science Center University Of Miyazaki

• Katto Masahito

  Cooperative Research Center University Of Miyazaki

• Iwai Yuki

  Dep. Of Electronics And Bioinformatics Sci. And Technol. Meiji Univ.

• INOUE Yoshihide

  Scientific Equipment Division

• Sasaki Wataru

  Department Of Cardiology Akita Kumiai Hospital

• Kurosawa Kou

  Department of Electrical and Electronic Engineering and Photon Science Center, University of Miyazaki, 1-1 Gakuen Kibanadai Nishi, Miyazaki, Miyazaki 889-2192, Japan

• Takigawa Yasuo

  Department of Electronic Engineering and Computer Science, Osaka Electro-Communication University, 18-8 Hatumachi, Neyagawa, Osaka 572-8530, Japan

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