The Depth Profiling of the Crystal Quality in Laser-Annealed Polycrystalline Si Films by Raman Microprobe

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1986-06-20

著者

• Inoue Yasuo

  Lsi Research & Development Laboratory Mitsubishi Electric Corporation

• NAKASHIMA Shin-ichi

  Department of Applied Physics,Osaka University

• MITSUISHI Akiyoshi

  Department of Applied Physics,Osaka University

• Nishimura Tadashi

  Lsi Research & Development Laboratory Mitsubishi Electric Corporation

• Nishimura T

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• IZUMI Yoshitaka

  NHK Science and Technical Research Laboratories

• Akasaka Y

  Lsi Research & Development Laboratory Mitsubishi Electric Corporation

• INOUE Yasuo

  Department of Applied Physics, Osaka University

• NISHIMURA Tadashi

  Research and Development Laboratory, Mitsubishi Electric Corporation

• AKASAKA Yoichi

  Research and Development Laboratory, Mitsubishi Electric Corporation

• Mitsuishi A

  Department Of Applied Physics Osaka University

• Mitsuishi Akiyoshi

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Iwai Yuki

  Dep. Of Electronics And Bioinformatics Sci. And Technol. Meiji Univ.

• Nakashima S

  Ntt Telecommunications Energy Lab. Atsugi Jpn

• Nakashima Shin-ichi

  Department Of Applied Physics Faculty Of Engineering Osaka University

• Niina T

  Microelectronics Research Center Sanyo Electric Co. Ltd.

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