Raman Scattering Measurements of Strains in ZnSe Epitaxial Films on GaAs : Techniques, Instrumentations and Measurement
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概要
- 論文の詳細を見る
Raman spectroscopy has been applied to the evaluation of strains in ZnSe films grown by molecular beam epitaxy on GaAs. The observed variation of the ZnSe LO phonon frequency with thickness is explained well in terms of the conversion from the elastic strain due to accommodation of the lattice mismatch to the thermal strain due to the difference in thermal expansion coefficients of the substrate and epitaxial film. The strains estimated from the Raman measurements are consistent with the results obtained from X-ray analyses by other researchers.
- 社団法人応用物理学会の論文
- 1988-07-20
著者
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MITSUISHI Akiyoshi
Department of Applied Physics,Osaka University
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Mizoguchi Kohji
Department Of Applied Physics Faculty Of Engineering Osaka City University
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Mitsuishi A
Department Of Applied Physics Osaka University
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Mitsuishi Akiyoshi
Department Of Applied Physics Faculty Of Engineering Osaka University
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FUJII Akihito
Department of Applied Physics, Osaka University
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Fujii A
Okayama Univ. Graduate School Of Medicine And Dentistry
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Nakashima S
Ntt Telecommunications Energy Lab. Atsugi Jpn
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Nakashima Shin-ichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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YONEDA Kiyoshi
Semiconductor Research Center, Sanyo Electric Co., Ltd.,
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Yoneda Kiyoshi
Semiconductor Research Center Sanyo Electric Co. Ltd.
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